Inventor

Marco Polizzi

Inventor
Eindhoven, NL

Overview

9→
Patents
2009–2020
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
B01DSeparation14%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them14%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2020Patents assigned to ASML NETHERLANDS BV (9)· patent assignee history
2009–2020Patents assigned to ASML HOLDING NV (6)· patent assignee history
2009–2020Based in Eindhoven, NL· patent location history
2013–2015Patents assigned to KEMPER NICOLAAS RUDOLF (3)· patent assignee history
2013–2015Patents assigned to OTTENS JOOST JEROEN (3)· patent assignee history
2013–2015Patents assigned to POLIZZI MARCO (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV92009–2020
ASML HOLDING NV62009–2020
KEMPER NICOLAAS RUDOLF32013–2015
OTTENS JOOST JEROEN32013–2015
POLIZZI MARCOself32013–2015
Locations
LocationPatentsSpan
Eindhoven, NL92009–2020