LexDanaLexDanabeta
Inventor

Wei-chun FONG

Inventor
US

Overview

1→
Patents
2026
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G06FElectric digital data processing50%
PatentTitleYear
12,566,368Method for determining a mask pattern comprising optical proximity corrections using a trained machine learning model2026

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2026Patents assigned to ASML NETHERLANDS (1)· patent assignee history
2026Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS12026
ASML NETHERLANDS BV12026
Locations
LocationPatentsSpan
US12026