Inventor

Satoshi Imura

Inventor
Tokuyama, JP

Overview

16→
Patents
1989–2006
Patent span
Chemistry
Primary field (CPC C)

Patents· 16 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere23%
G03CPhotosensitive materials for photographic purposes20%
C07DHeterocyclic compounds18%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
G02BOptical elements, systems or apparatus5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
B82YSpecific uses or applications of nanostructures2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–1994Patents assigned to TOKUYAMA SODA KK (5)· patent assignee history
1989–1999Based in Tokuyama, JP· patent location history
1993Patents assigned to TOKUYAMA SODA KABISHIKI KAISHA (1)· patent assignee history
1995–1999Patents assigned to TOKUYAMA CORP (9)· patent assignee history
1996Based in Tsukuba, JP· patent location history
1998Based in Shinnanyo, JP· patent location history
2006Patents assigned to TOSHIBA MACHINE CO LTD (1)· patent assignee history
2006Based in Numazu, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKUYAMA CORP91995–1999
TOKUYAMA SODA KK51989–1994
TOKUYAMA SODA KABISHIKI KAISHA11993
TOSHIBA MACHINE CO LTD12006
Locations
LocationPatentsSpan
Tokuyama, JP131989–1999
Numazu, JP12006
Shinnanyo, JP11998
Tsukuba, JP11996