Inventor

JU HWAN JEONG

Inventor

Overview

2→

Patents

2025

Patent span

Chemistry

Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material50%

C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium25%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%

PatentTitleYear

12,421,605Method for areal selective forming of thin film2025 12,252,781Area-selective method for forming thin film by using nuclear growth retardation2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to EGTM CO LTD (2)· patent assignee history

2025Based in KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
EGTM CO LTD	2	2025

Locations

Location	Patents	Span
KR	2	2025