Inventor

Kosei Ueno

Inventor

Hokkaido, JP

Overview

2010–2016

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary

B82YSpecific uses or applications of nanostructures12%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light12%

Y10TTechnical subjects covered by former us classification12%

B22FWorking metallic powder8%

C22CAlloys8%

G01NInvestigating or analysing materials by determining their chemical or physical properties8%

H01LSemiconductor devices8%

G02BOptical elements, systems or apparatus4%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%

H01GCapacitors4%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2010–2016Patents assigned to UNIV HOKKAIDO NAT UNIV CORP (6)· patent assignee history

2010–2016Based in Sapporo, JP· patent location history

2011–2012Patents assigned to ROHM CO LTD (3)· patent assignee history

2011–2014Based in Hokkaido, JP· patent location history

2012–2016Patents assigned to MISAWA HIROAKI (4)· patent assignee history

2012–2016Patents assigned to UENO KOSEI (4)· patent assignee history

2012Patents assigned to MUGINO YOICHI (2)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Hokkaido, JP	4	2011–2014
Sapporo, JP	3	2010–2016