Inventor

Nariaki Tanaka

Inventor

Kiyosu, JP

Overview

1991–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 43 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary

H01LSemiconductor devices26%

G03GElectrography24%

H10DInorganic electric semiconductor devices24%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%

C07CAcyclic or carbocyclic compounds1%

PatentTitleYear

10,879,349Method for manufacturing semiconductor device and edge termination structure of semiconductor device2020 10,854,454Semiconductor device and method for manufacturing the same2020 10,832,911Semiconductor device2020 10,698,359Image forming apparatus and image forming method2020 10,635,013Image forming apparatus and image forming method2020 10,490,408Method for manufacturing semiconductor device2019 10,310,441Electrophotographic image forming apparatus, and electricity removing member used in image forming apparatus2019 10,256,323Method of manufacturing semiconductor device including an n type semiconductor region formed in a p type semiconductor layer2019 10,177,234Semiconductor device2019 10,153,356Method of manufacturing semiconductor device, and semiconductor device2018 10,153,352Semiconductor device2018 10,042,318Electrophotographic image forming apparatus and electricity removing member used in the same2018 10,026,808Semiconductor device including insulating film that includes negatively charged microcrystal2018 9,985,127Semiconductor device including a mesa groove and a recess groove2018 9,972,725Semiconductor device and manufacturing method of the same2018 9,711,661'Semiconductor device and manufacturing method thereof'2017 9,691,846'Semiconductor device including an insulating layer which includes negatively charged microcrystal'2017 9,685,348'Semiconductor device, method of manufacturing the same and power converter'2017 9,653,564'Semiconductor device and method of manufacturing the same'2017 9,583,580'Manufacturing method of the semiconductor device electrode having three metal layers'2017 9,559,218'Semiconductor device and method of manufacturing the same'2017 9,443,950'Semiconductor device'2016 9,431,260'Semiconductor device and manufacturing method of the same'2016 9,391,150'Semiconductor Device'2016 9,331,157'Semiconductor device'2016 9,123,635'Manufacturing method of semiconductor device'2015 7,395,011'Image forming apparatus with cleaning device for removing remaining toner from outer surface of photosensitive member'2008 6,778,796'Driving mechanism for use in image forming apparatus'2004 6,483,998'Electrostatic image-forming apparatus controlled to compensate for film thinning'2002 6,205,314'Developing roller with a coating layer, developer restricting mechanism and developing device incorporating same'2001 6,025,108'Non-magnetic contacting one component-type development system'2000 5,914,208'Electrophotographic photosensitive material'1999 5,842,104'Image-forming device and a process unit therefor having a guide plate with multiple openings'1998 5,830,615'Naphthylenediamine derivative and electrophotosensitive material using the same'1998 5,752,132'Process unit'1998 5,750,308'Electrophotographic developing method using developing bias voltage based on light decay characteristics of photosensitive material'1998 5,565,963'Image forming apparatus capable of changing the surface potential of a photosensitive member'1996 5,534,980'Electrophotographic image forming apparatus having a charge removing means'1996 5,530,525'Image forming apparatus'1996 5,530,524'Electrophotographic apparatus with photosensitive drum requiring multiple rotations for production of a copy image on one sheet and method of operating same'1996 5,260,157'Electrophotographic photosensitive element comprising a surface protective layer comprising an etherified melamine-formaldehyde resin'1993 5,060,022'Image processing equipment for setting image density conditions according to temperature'1991 5,024,913'Electrophotographic photosensitive material'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2000Patents assigned to MITA INDUSTRIAL CO LTD (13)· patent assignee history

1991–2020Based in Osaka, JP· patent location history

1991Based in Kishiwada, JP· patent location history

1998Based in Chuo-ku, JP· patent location history

2001–2008Patents assigned to KYOCERA MITA CORP (4)· patent assignee history

2001–2004Based in Osakasayama, JP· patent location history

2004Patents assigned to KYOCERA CORP (1)· patent assignee history

2015–2020Patents assigned to TOYODA GOSEI KK (22)· patent assignee history

2015–2020Based in Kiyosu, JP· patent location history

2018–2020Patents assigned to KYOCERA DOCUMENT SOLUTIONS INC (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOYODA GOSEI KK	22	2015–2020
MITA INDUSTRIAL CO LTD	13	1991–2000
KYOCERA DOCUMENT SOLUTIONS INC	4	2018–2020
KYOCERA MITA CORP	4	2001–2008
KYOCERA CORP	1	2004

Locations

Location	Patents	Span
Kiyosu, JP	22	2015–2020
Osaka, JP	17	1991–2020
Osakasayama, JP	2	2001–2004
Chuo-ku, JP	1	1998
Kishiwada, JP	1	1991