Inventor
MASAHITO YAHAGI
Inventor
JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds21%
C09DCoating compositions, e.g. paints, varnishes or lacquers21%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
C08LCompositions of macromolecular compounds7%
C07CAcyclic or carbocyclic compounds3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
PatentTitleYear
12,449,729Resist composition and method of forming resist pattern202512,411,408Resist composition and method of forming resist pattern202512,099,298Resist composition and method of forming resist pattern202411,693,313Resist composition and method of forming resist pattern202311,656,549Resist composition and method of forming resist pattern202311,586,111Resist composition and method of forming resist pattern202311,392,033Resist composition and method of forming resist pattern202211,372,329Resist composition and method of forming resist pattern202211,275,306Resist composition and method of forming resist pattern202211,204,551Resist composition and method for forming resist pattern202111,187,981Resist composition and method of forming resist pattern2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to TOKYO OHKA KOGYO CO LTD (11)· patent assignee history
2021–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 11 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 11 | 2021–2025 |