Inventor
James P. McGuire, Jr.
Inventor
Pasadena, CA, US
Overview
Patents· 49 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
B22DCasting of metals5%
A61BDiagnosis4%
A61NElectrotherapy3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
Y10TTechnical subjects covered by former us classification3%
B82YSpecific uses or applications of nanostructures2%
C21CProcessing of pig-iron, e.g. refining, manufacture of wrought-iron or steel2%
PatentTitleYear
10,194,986Low profile apparatus and method for phototherapy20199,554,856'Low profile apparatus and method for phototherapy'20179,367,648'Specification-guided user interface for optical design systems'20168,842,272'Apparatus for EUV imaging and methods of using same'20148,685,010'Photothermal treatment of soft tissues'20148,070,290'Gonioscope for improved viewing'20117,777,955'Rippled mixers for uniformity and color mixing'20107,738,172'Structures and methods for reducing aberration in optical systems'20107,656,582'Methods for reducing polarization aberration in optical systems'20107,651,243'Phosphor wheel illuminator'20107,542,209'Compact head mounted display devices with tilted/decentered lens element'20097,519,247'Wavelength selective optical switch'20097,511,885'Methods for reducing polarization aberration in optical systems'20097,481,544'Grazing incidence relays'20097,453,641'Structures and methods for reducing aberration in optical systems'20087,450,310'Head mounted display devices'20087,360,899'Beamsplitting structures and methods in optical systems'20087,330,615'Wavelength selective optical switch'20087,206,133'Light distribution apparatus and methods for illuminating optical systems'20077,203,421'Littrow grating based OADM'20077,196,849'Apparatus and methods for illuminating optical systems'20077,177,493'Programmable optical add/drop multiplexer'20077,075,720'Structures and methods for reducing polarization aberration in optical systems'20067,075,696'Correction of birefringence in cubic crystalline optical systems'20067,072,102'Methods for reducing polarization aberration in optical systems'20067,058,251'Wavelength selective optical switch'20067,046,338'EUV condenser with non-imaging optics'20067,009,769'Correction of birefringence in cubic crystalline optical systems'20066,995,908'Methods for reducing aberration in optical systems'20066,970,232'Structures and methods for reducing aberration in integrated circuit fabrication systems'20056,958,864'Structures and methods for reducing polarization aberration in integrated circuit fabrication systems'20056,947,192'Correction of birefringence in cubic crystalline optical systems'20056,941,073'East-west separable ROADM'20056,917,458'Correction of birefringence in cubic crystalline optical systems'20056,885,488'Semiconductor device and method for forming the same using cubic crystalline optical system with reduced birefringence'20056,844,972'Reducing aberration in optical systems comprising cubic crystalline optical elements'20056,760,095'EUV condenser with non-imaging optics'20046,683,710'Correction of birefringence in cubic crystalline optical systems'20046,636,654'Programmable optical switching add/drop multiplexer'20036,573,978'EUV condenser with non-imaging optics'20036,210,865'Extreme-UV lithography condenser'20016,195,201'Reflective fly\'s eye condenser for EUV lithography'20016,144,495'Projection light source'20006,122,107'Angular integrator'20005,423,522'Slag control shape release apparatus for molten metal vessels'19955,421,560'Slag control apparatus for molten metal vessels'19955,303,902'Slag control shape release apparatus for molten metal vessels'19945,249,780'Slag control shape release apparatus for molten metal vessels'19934,968,007'Anti-slag, anti-vortex tundish measurement apparatus'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1990–1995Patents assigned to AJF INC (5)· patent assignee history
1990–1995Based in Taylor, MI, US· patent location history
2000–2019Based in Pasadena, CA, US· patent location history
2003–2010Patents assigned to OPTICAL RES ASSOCIATES (17)· patent assignee history
2004–2006Patents assigned to ASML HOLDING NV (2)· patent assignee history
2005–2010Patents assigned to ASML NETHERLANDS BV (13)· patent assignee history
2014–2019Patents assigned to GRADIANT RES LLC (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| OPTICAL RES ASSOCIATES | 17 | 2003–2010 |
| ASML NETHERLANDS BV | 13 | 2005–2010 |
| AJF INC | 5 | 1990–1995 |
| GRADIANT RES LLC | 3 | 2014–2019 |
| ASML HOLDING NV | 2 | 2004–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Pasadena, California, US | 44 | 2000–2019 |
| Taylor, MI, US | 5 | 1990–1995 |