Inventor

Akihiro Morimoto

Inventor
Osaka, JP

Overview

62→
Patents
1995–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 62 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Tprimary
Y10TTechnical subjects covered by former us classification10%
C01BNon-metallic elements8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
G05DSystems for controlling or regulating non-electric variables4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
C23CCoating metallic material3%
F16KValves3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
PatentTitleYear
9,579,978'In-vehicle charger'20179,482,452'Thermoelectric module'20169,155,209'Flex-rigid printed wiring board and manufacturing method thereof'20158,816,183'Thermoelectric module and optical transmission apparatus'20148,502,450'Vacuum tube and vacuum tube manufacturing apparatus and method'20138,469,046'Method for parallel operation of reactors that generate moisture'20138,455,969'Semiconductor device and method for manufacturing the same'20138,389,867'Multilayered circuit substrate with semiconductor device incorporated therein'20138,227,912'Semiconductor device with Cu metal-base and manufacturing method thereof'20128,217,270'Multilayer circuit board and electronic device'20128,188,372'Flex-rigid printed wiring board and manufacturing method thereof'20128,137,787'Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas'20128,064,003'Thin film transistor integrated circuit device, active matrix display device, and manufacturing methods of the same'20117,995,001'Antenna for portable terminal and portable terminal using same'20117,988,130'Valve for vacuum exhaustion system'20117,939,360'Semiconductor device and manufacturing method therefor'20117,935,385'Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas'20117,893,345'Thermoelectric module device'20117,887,385'Organic EL light emitting element, manufacturing method thereof, and display device'20117,815,872'Reactor for generating moisture and moisture generating and feeding apparatus for which the reactor is employed'20107,796,401'Chip element'20107,673,649'Vacuum thermal insulating valve'20107,595,087'Process of forming platinum coating catalyst layer in moisture-generating reactor'20097,553,459'Apparatus and reactor for generating and feeding high purity moisture'20097,503,180'Thermoelectric conversion module and electronic device'20097,501,764'Fluorescent lamp and method of manufacturing same'20097,472,887'Valve for vacuum exhaustion system'20097,416,165'Diaphragm valve for the vacuum exhaustion system'20087,368,092'Apparatus and reactor for generating and feeding high purity moisture'20087,331,695'Visible light-reflecting member'20087,258,845'Apparatus and reactor for generating and feeding high purity moisture'20077,239,084'Organic EL device and liquid crystal display'20077,103,990'Rotary silicon wafer cleaning apparatus'20067,008,598'Reactor for generating moisture'20066,992,008'Method of making a substrate having buried structure and method for fabricating a display device including the substrate'20066,919,056'Reactor for generating moisture'20056,848,470'Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus'20056,820,632'Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus'20046,815,720'Substrate having buried structure, display device including the substrate, method of making the substrate and method for fabricating the display device'20046,733,732'Reactor for generating moisture'20046,672,942'Grinding machine for welding electrodes'20046,622,543'Gas detection sensor'20036,422,264'Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus'20026,408,879'Fluid control device'20026,387,158'Method of removing moisture in gas supply system'20026,347,279'Car navigation system'20026,334,962'Low flow rate moisture supply process'20026,274,098'Apparatus for the treatment of exhaust gases by combining hydrogen and oxygen'20016,273,477'Gasket and pipe joint'20016,180,067'Reactor for the generation of water'20016,093,662'Method for generating water for semiconductor production'20006,031,034'Polypropylene-based resin composition'20005,879,819'Sliding parts and process for producing same'19995,816,285'Pressure type flow rate control apparatus'19985,812,139'Method and apparatus for graphic processing including anti-aliasing and flicker removal'19985,791,369'Pressure type flow rate control apparatus'19985,739,773'Vehicular navigation apparatus enabling easy recognition of displayed traffic information'19985,711,197'Tube facing machine'19985,669,408'Pressure type flow rate control apparatus'19975,530,283'Lead frame and lead frame material'19965,520,492'Sliding parts and method of producing same'19965,440,096'Welding process with delayed application of full current until after start of arc'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2013Based in Osaka, JP· patent location history
1996–2013Patents assigned to FUJIKIN KK (32)· patent assignee history
1998–2015Patents assigned to OHMI TADAHIRO (20)· patent assignee history
2002–2017Based in Kanagawa, JP· patent location history
2004–2015Based in Sendai, JP· patent location history
2008–2015Patents assigned to MORIMOTO AKIHIRO (13)· patent assignee history
2008–2013Patents assigned to FOUND ADVANCEMENT INT SCIENCE (5)· patent assignee history
2008–2012Based in Miyagi, JP· patent location history
2009–2016Patents assigned to AISIN SEIKI (4)· patent assignee history
2009–2016Based in Toyota, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJIKIN KK321996–2013
OHMI TADAHIRO201998–2015
MORIMOTO AKIHIROself132008–2015
FOUND ADVANCEMENT INT SCIENCE52008–2013
AISIN SEIKI42009–2016
Locations
LocationPatentsSpan
Osaka, JP361995–2013
Sendai, JP82004–2015
Miyagi, JP62008–2012
Kanagawa, JP42002–2017
Toyota, JP42009–2016