LexDanaLexDanabeta
Inventor

Yukio Hayakawa

Inventor
Kyoto, JP

Overview

58→
Patents
1981–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 58 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Bprimary
H10BElectronic memory devices22%
H01LSemiconductor devices13%
H10NElectric solid-state devices not otherwise provided for13%
H10DInorganic electric semiconductor devices13%
G11CStatic stores7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
B60GVehicle suspension arrangements5%
F16FSprings5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
F02DControlling combustion engines1%
PatentTitleYear
10,256,246Convex shaped thin-film transistor device having elongated channel over insulating layer in a groove of a semiconductor substrate20199,831,113Semiconductor device having element separation region formed from a recess-free trench20179,748,254'Convex shaped thin-film transistor device having elongated channel over insulating layer in a groove of a semiconductor substrate'20179,680,093'Nonvolatile memory element, nonvolatile memory device, nonvolatile memory element manufacturing method, and nonvolatile memory device manufacturing method'20179,515,081'Semiconductor device and method for manufacturing thereof'20169,478,584'Nonvolatile memory device and method for manufacturing the same'20169,472,564'System with memory having voltage applying unit'20169,444,044'Resistive nonvolatile storage device, manufacturing method for same, and resistive nonvolatile storage apparatus'20169,231,112'Convex shaped thin-film transistor device having elongated channel over insulating layer'20169,214,628'Nonvolatile memory element, nonvolatile memory device, and manufacturing method for the same'20159,184,381'Nonvolatile storage element and method for manufacturing same'20159,172,038'Nonvolatile memory element and method of manufacturing the same'20159,142,775'Method of manufacturing semiconductor memory device'20159,064,570'Non-volatile memory device and method for manufacturing the same'20159,061,562'Suspension control apparatus'20159,054,305'Nonvolatile memory device and method of manufacturing the same'20159,000,506'Variable resistance nonvolatile memory element and method for manufacturing the same'20158,995,170'Non-volatile memory device'20158,995,171'Designing method of non-volatile memory device, manufacturing method of non-volatile memory device, and non-volatile memory device'20158,994,093'Semiconductor device with ONO film'20158,969,168'Method for manufacturing variable resistance element'20158,895,405'Method for manufacturing a semiconductor device'20148,889,478'Method for manufacturing nonvolatile semiconductor memory element, and nonvolatile semiconductor memory element'20148,861,257'Nonvolatile memory element, manufacturing method thereof, nonvolatile memory device, and design support method for nonvolatile memory element'20148,759,190'Current steering element and non-volatile memory element incorporating current steering element'20148,716,082'Semiconductor device, method of controlling the same, and method of manufacturing the same'20148,691,645'Method of manufacturing convex shaped thin-film transistor device'20148,618,526'Nonvolatile memory device and manufacturing method thereof'20138,574,957'Method for manufacturing nonvolatile semiconductor memory element'20138,530,321'Variable resistance element and manufacturing method thereof'20138,481,990'Nonvolatile memory element'20138,482,958'Current steering element, memory element, memory, and method of manufacturing current steering element'20138,437,173'Nonvolatile memory element, manufacturing method thereof, design support method therefor, and nonvolatile memory device'20138,369,161'Semiconductor device and control method therefor'20138,318,566'Method to seperate storage regions in the mirror bit device'20128,264,029'Convex shaped thin-film transistor device'20128,143,661'Memory cell system with charge trap'20128,003,468'Separation methods for semiconductor charge accumulation layers and structures thereof'20117,928,018'Plasma processing method and method for manufacturing an electronic device'20117,915,663'Fabrication and method of operation of multi-level memory cell on SOI substrate'20117,902,590'Semiconductor device, method of controlling the same, and method of manufacturing the same'20117,323,744'Semiconductor device and fabrication method therefor'20087,274,592'Non-volatile memory and method of controlling the same'20076,873,022'Semiconductor device and method for manufacturing the same'20056,811,271'Electromagnetic wave focusing device'20046,691,841'Shock absorber with leveling function'20046,615,961'Seal construction of shock absorber with leveling function'20036,328,144'Inverted type of vehicular damper with vehicle height adjusting function'20016,260,677'Damper with vehicle height adjusting function'20016,247,683'Damper with vehicle height adjustment function'20016,179,098'Vehicular damper with vehicle height adjusting function having an internal heat source'20016,170,621'Vehicular damper with vehicle height adjusting function'20015,996,978'Hydraulic damper for vehicle'19995,927,071'Hydraulic pressure source apparatus and vehicle height control apparatus'19995,881,801'Thermally driven liquid pressure generating apparatus'19995,175,689'Apparatus for processing tool path to obtain workpiece examination data'19924,304,210'System and method for controlling EGR in internal combustion engine'19814,300,516'System and method for controlling exhaust gas recirculation'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2001Based in Tochigi, JP· patent location history
2003–2015Based in Wako, JP· patent location history
2005–2017Based in Aizuwakamatsu, JP· patent location history
2007–2016Patents assigned to SPANSION LLC (14)· patent assignee history
2011–2019Based in Fukushima, JP· patent location history
2012–2017Patents assigned to HAYAKAWA YUKIO (22)· patent assignee history
2013–2017Patents assigned to MIKAWA TAKUMI (14)· patent assignee history
2013–2015Patents assigned to PANASONIC CORP (13)· patent assignee history
2013–2017Based in Kyoto, JP· patent location history
2015–2017Patents assigned to PANASONIC IP MAN CO LTD (13)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HAYAKAWA YUKIOself222012–2017
MIKAWA TAKUMI142013–2017
SPANSION LLC142007–2016
PANASONIC CORP132013–2015
PANASONIC IP MAN CO LTD132015–2017
Locations
LocationPatentsSpan
Kyoto, JP222013–2017
Fukushima, JP122011–2019
Aizuwakamatsu, JP82005–2017
Tochigi, JP51999–2001
Wako, JP32003–2015