Inventor
Lawrence Bourget
Inventor
Reading, MA, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material46%
H01JElectric discharge tubes or discharge lamps23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1015%
PatentTitleYear
6,051,114'Use of pulsed-DC wafer bias for filling vias/trenches with metal in HDP physical vapor deposition'20005,792,522'High density plasma physical vapor deposition'19985,688,382'Microwave plasma deposition source and method of filling high aspect-ratio features on a substrate'19975,518,759'High growth rate plasma diamond deposition process and method of controlling same'19965,405,645'High growth rate plasma diamond deposition process and method of controlling same'19955,279,866'Process for depositing wear-resistant coatings'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–1997Patents assigned to APPLIED SCIENCE & TECH INC (4)· patent assignee history
1994–1996Based in Winchester, MA, US· patent location history
1997–2000Based in Reading, MA, US· patent location history
1998Patents assigned to INTEL CORP (1)· patent assignee history
2000Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED SCIENCE & TECH INC | 4 | 1994–1997 |
| APPLIED MATERIALS INC | 1 | 2000 |
| INTEL CORP | 1 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Reading, Massachusetts, US | 3 | 1997–2000 |
| Winchester, Massachusetts, US | 3 | 1994–1996 |