Inventor
Jae Won Hahn
Inventor
Seoul, KR
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B82Yprimary
B82YSpecific uses or applications of nanostructures17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light10%
H01JElectric discharge tubes or discharge lamps10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
G02BOptical elements, systems or apparatus7%
H05KPrinted circuits7%
Y10TTechnical subjects covered by former us classification7%
B29CShaping or joining of plastics3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
PatentTitleYear
9,958,322Device for preventing intensity reduction of optical signal, optical emission spectrometer, optical instrument, and mass spectrometer including the same20189,028,639'Method of manufacturing stamp for plasmonic nanolithography apparatus and plasmonic nanolithography apparatus'20159,025,143'Device for preventing intensity reduction of optical signal, optical emission spectrometer, optical instrument, and mass spectrometer including the same'20158,490,210'Contact type plasmonic nano optical probe, parallel probe constituted of the same, plasmonic optical apparatus including the parallel probe, and a method of fabricating the parallel probe'20138,416,509'Optical apparatus'20138,101,258'High density information storage medium having plasmonic nano device'20127,969,555'Lens structure, optical system having the same, and lithography method using the optical system'20117,952,684'Light-modulating nano/micro scale aperture array device having immersion layer and high speed nano scale pattern recording system using the same'20117,400,380'Two-dimensional light-modulating nano/micro aperture array and high-speed nano pattern recording system utilized with the array'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2018Based in Seoul, KR· patent location history
2011–2018Patents assigned to UNIV YONSEI IACF (5)· patent assignee history
2011Patents assigned to IND ACADEMIC COOP (1)· patent assignee history
2012–2015Patents assigned to HAHN JAE WON (3)· patent assignee history
2013Patents assigned to CHAE SEUNGKI (1)· patent assignee history
2013Patents assigned to HAHN JAE-WON (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNIV YONSEI IACF | 5 | 2011–2018 |
| HAHN JAE WONself | 3 | 2012–2015 |
| CHAE SEUNGKI | 1 | 2013 |
| HAHN JAE-WONself | 1 | 2013 |
| IND ACADEMIC COOP | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 9 | 2008–2018 |