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Inventor

MASUMI NISHIJIMA

Inventor
JP

Overview

2→
Patents
2023–2024
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B08Bprimary
B08BCleaning in general29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure14%
G01MTesting static or dynamic balance of machines or structures14%
H01LSemiconductor devices14%
PatentTitleYear
11,911,806Substrate cleaning device, abnormality determination method of substrate cleaning device, storage medium202411,817,311Substrate cleaning method and substrate cleaning apparatus2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2024Patents assigned to EBARA CORP (2)· patent assignee history
2023–2024Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP22023–2024
Locations
LocationPatentsSpan
JP22023–2024