Inventor
Yasushi Sakaida
Inventor
Toyama, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01LSemiconductor devices13%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C08LCompositions of macromolecular compounds3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
C07DHeterocyclic compounds1%
PatentTitleYear
11,131,928Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive202111,112,696Protective film-forming composition202110,684,546Composition for forming resist underlayer film202010,509,320Underlying coating forming composition for lithography containing compound having protected carboxyl group201910,289,002Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer201910,113,083Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound201810,067,423Additive and resist underlayer film-forming composition containing the same201810,042,247Mask blank, method for manufacturing mask blank and transfer mask201810,025,191Polymer-containing coating liquid applied to resist pattern20189,910,354'Resist underlayer film-forming composition and method for forming resist pattern using the same'20189,753,369'Polymer-containing developer'20179,746,764'Mask blank and transfer mask'20179,632,414'Coating liquid to be applied to resist pattern and method for forming reverse pattern'20179,165,781'Composition for forming pattern reversal film and method for forming reversal pattern'20159,093,279'Thin film forming composition for lithography containing titanium and silicon'20158,916,327'Underlayer coating forming composition containing dextrin ester compound'20148,822,138'Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring'20148,658,341'Pattern reversal film forming composition and method of forming reversed pattern'20148,283,103'Composition for forming resist underlayer film for lithography and production method of semiconductor device'20128,007,979'Acrylic polymer-containing gap fill material forming composition for lithography'20117,842,620'Method for manufacturing semiconductor device using quadruple-layer laminate'20107,727,902'Composition for forming nitride coating film for hard mask'20107,365,023'Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating'20087,226,721'Underlayer coating forming composition for lithography containing compound having protected carboxyl group'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2019Patents assigned to NISSAN CHEMICAL IND LTD (20)· patent assignee history
2007–2021Based in Toyama, JP· patent location history
2012–2019Patents assigned to SAKAIDA YASUSHI (8)· patent assignee history
2012–2019Patents assigned to TAKEI SATOSHI (3)· patent assignee history
2014–2019Patents assigned to SHINJO TETSUYA (3)· patent assignee history
2020–2021Patents assigned to NISSAN CHEMICAL CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL IND LTD | 20 | 2007–2019 |
| SAKAIDA YASUSHIself | 8 | 2012–2019 |
| NISSAN CHEMICAL CORP | 3 | 2020–2021 |
| SHINJO TETSUYA | 3 | 2014–2019 |
| TAKEI SATOSHI | 3 | 2012–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 24 | 2007–2021 |