Inventor
Xiangzhao Wang
Inventor
Shanghai, CN
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Mprimary
G01MTesting static or dynamic balance of machines or structures38%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light25%
PatentTitleYear
9,863,841'Measuring device having ideal wavefront generator for detecting point diffraction interferometric wavefront aberration of measured optical system and method for detecting wavefront aberration thereof'20189,766,154'Multi field point aberration parallel metrology device and method for lithographic projection lens'20179,658,114'Device for measuring point diffraction interferometric wavefront aberration and method for detecting wave aberration'20178,035,801'Method for in-situ aberration measurement of optical imaging system in lithographic tools'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011Patents assigned to SHANGHAI MICROELECTRONICS EQUI (1)· patent assignee history
2011–2018Based in Shanghai, CN· patent location history
2017–2018Patents assigned to SHANGHAI INST OPTICS & FINE MECH CAS (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHANGHAI INST OPTICS & FINE MECH CAS | 3 | 2017–2018 |
| SHANGHAI MICROELECTRONICS EQUI | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shanghai, CN | 4 | 2011–2018 |