Inventor
Steve Lien-Chung Hsu
Inventor
Tainan, TW
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds23%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
B05DProcesses for applying fluent materials to surfaces, in general3%
B29DProducing particular articles from plastics or from substances in a plastic state3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
H01BCables3%
PatentTitleYear
9,902,862'Method of fabricating nano-silver paste having high bonding strength'20189,705,146'Method of fabricating proton-conducting electrolytic membrane'20177,081,491'Method for fabricating polybenzoxazole/clay nanocomposite materials'20067,056,641'Photosensitive resin compositions'20066,939,659'Photosensitive resin compositions'20056,670,090'Positive working photosensitive composition, article and process for forming a relief pattern'20036,548,621'Synthesis of poly (imide-benzoxazole) copolymer'20036,214,516'Photosensitive resin compositions'20016,177,225'Photosensitive resin compositions'20016,143,467'Photosensitive polybenzoxazole precursor compositions'20006,127,086'Photosensitive resin compositions'20006,124,178'Method of manufacturing MOSFET devices'20005,834,581'Process for making polyimide-polyamic ester copolymers'19985,789,525'Process for making polyimides from diamines and tetracarboxylic diacid diester'19985,789,524'Chemical imidization reagent for polyimide synthesis'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998Patents assigned to OLIN MICROELECTRONIC CHEM INC (3)· patent assignee history
1998Based in East Providence, RI, US· patent location history
2000–2006Patents assigned to ARCH SPEC CHEM INC (6)· patent assignee history
2000Patents assigned to MOSEL VITELIC INC (1)· patent assignee history
2000–2018Based in Tainan, TW· patent location history
2000Based in Hsinchu County, TW· patent location history
2003Patents assigned to IND TECH RES INST (2)· patent assignee history
2005–2006Based in Taiwan, TW· patent location history
2006–2018Patents assigned to UNIV NAT CHENG KUNG (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ARCH SPEC CHEM INC | 6 | 2000–2006 |
| OLIN MICROELECTRONIC CHEM INC | 3 | 1998 |
| UNIV NAT CHENG KUNG | 3 | 2006–2018 |
| IND TECH RES INST | 2 | 2003 |
| MOSEL VITELIC INC | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tainan, TW | 9 | 2000–2018 |
| East Providence, RI, US | 3 | 1998 |
| Taiwan, TW | 2 | 2005–2006 |
| Hsinchu County, TW | 1 | 2000 |