LexDanaLexDanabeta
Inventor

Tetsuro Nakasugi

Inventor
Yokohama, JP

Overview

47→
Patents
1999–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 47 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary
B82YSpecific uses or applications of nanostructures29%
H01JElectric discharge tubes or discharge lamps23%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
B29CShaping or joining of plastics4%
G21KHandling of particles or ionising radiation not otherwise provided for3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
B05DProcesses for applying fluent materials to surfaces, in general2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
H01LSemiconductor devices2%
PatentTitleYear
11,004,683Imprint apparatus, imprint method, and method of manufacturing semiconductor device202110,796,948Pattern forming method and imprint apparatus20209,885,118'Template forming method, template, and template base material'20189,381,540'Pattern forming method'20169,360,752'Pattern formation method'20169,188,879'Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method'20159,046,763'Pattern forming method'20158,992,789'Method for manufacturing mold'20158,973,494'Imprint method and imprint apparatus'20158,895,210'Method for fabricating pellicle, photo mask, and semiconductor device'20148,883,373'Method for manufacturing photo mask, method for manufacturing semiconductor device, and program'20148,550,801'Imprint apparatus and method'20138,419,995'Imprint method'20138,227,267'Template inspection method and manufacturing method for semiconductor device'20128,202,463'Imprint method'20128,180,472'Control method for semiconductor manufacturing apparatus, control system for semiconductor manufacturing apparatus, and manufacturing method for semiconductor device'20128,118,585'Pattern formation method and a method for manufacturing a semiconductor device'20127,985,958'Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program'20117,889,910'Character pattern extracting method, charged particle beam drawing method, and character pattern extracting program'20117,648,809'Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program product'20107,482,604'Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device'20097,459,705'Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device'20087,435,978'System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor device'20087,368,737'Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method'20087,283,885'Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writing'20077,264,909'Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same'20077,242,014'Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device'20077,202,488'Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device'20077,045,801'Charged beam exposure apparatus having blanking aperture and basic figure aperture'20067,011,915'Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same'20066,941,008'Pattern forming method'20056,914,252'Charged beam exposure apparatus having blanking aperture and basic figure aperture'20056,897,454'Energy beam exposure method and exposure apparatus'20056,818,364'Charged particle beam exposure apparatus and exposure method'20046,803,589'Apparatus and method applied to exposure by charged beam'20046,762,421'Charged particle beam exposure apparatus and exposure method'20046,737,658'Pattern observation apparatus and pattern observation method'20046,703,629'Charged beam exposure apparatus having blanking aperture and basic figure aperture'20046,512,237'Charged beam exposure method and charged beam exposure apparatus'20036,507,034'Charge beam exposure apparatus, charge beam exposure method, and charge beam exposure mask'20036,376,136'Charged beam exposure method'20026,147,355'Pattern forming method'20006,140,654'Charged beam lithography apparatus and method thereof'20006,093,931'Pattern-forming method and lithographic system'20005,994,030'Pattern-forming method and lithographic system'19995,989,759'Pattern forming method using alignment from latent image or base pattern on substrate'19995,933,211'Charged beam lithography apparatus and method thereof'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2016Patents assigned to TOSHIBA KK (44)· patent assignee history
1999–2021Based in Yokohama, JP· patent location history
1999–2000Based in Tokyo, JP· patent location history
2008–2018Based in Kanagawa, JP· patent location history
2012–2015Patents assigned to NAKASUGI TETSURO (11)· patent assignee history
2012–2015Patents assigned to YONEDA IKUO (5)· patent assignee history
2012–2015Patents assigned to HATANO MASAYUKI (4)· patent assignee history
2018–2021Patents assigned to TOSHIBA MEMORY CORP (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA KK441999–2016
NAKASUGI TETSUROself112012–2015
YONEDA IKUO52012–2015
HATANO MASAYUKI42012–2015
TOSHIBA MEMORY CORP32018–2021
Locations
LocationPatentsSpan
Yokohama, JP351999–2021
Kanagawa, JP102008–2018
Tokyo, JP21999–2000