Inventor

Arie Jeffrey Den Boef

Inventor

Waalre, NL

Overview

14→

Patents

2021

Patent span

Physics

Primary field (CPC G)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%

G01NInvestigating or analysing materials by determining their chemical or physical properties24%

G01BMeasuring length, thickness or similar linear dimensions16%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein5%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%

G02BOptical elements, systems or apparatus3%

G03HHolographic processes or apparatus3%

G06FElectric digital data processing3%

G06NComputing arrangements based on specific computational models3%

H01LSemiconductor devices3%

PatentTitleYear

11,119,415Method of determining a characteristic of a structure, and metrology apparatus2021 11,106,142Metrology recipe selection2021 11,099,489Method of measuring a parameter of a lithographic process, metrology apparatus2021 11,092,902Method and apparatus for detecting substrate surface variations2021 11,080,459Computational wafer inspection2021 11,022,902Sensor, lithographic apparatus, and device manufacturing method2021 11,016,397Source separation from metrology data2021 11,009,343Metrology apparatus and method for determining a characteristic of one or more structures on a substrate2021 10,996,570Metrology method, patterning device, apparatus and computer program2021 10,996,571Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured2021 10,983,445Method and apparatus for measuring a parameter of interest using image plane detection techniques2021 10,955,353Method and apparatus for angular-resolved spectroscopic lithography characterization2021 10,901,330Recipe selection based on inter-recipe consistency2021 10,895,452Metrology apparatus2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to ASML NETHERLANDS BV (14)· patent assignee history

2021Based in Waalre, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	14	2021

Locations

Location	Patents	Span
Waalre, NL	14	2021