Inventor
Kenji Horino
Inventor
Tokyo, JP
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Gprimary
H01GCapacitors17%
H10DInorganic electric semiconductor devices14%
C22CAlloys11%
H01FMagnets11%
H05KPrinted circuits11%
B22FWorking metallic powder8%
Y10TTechnical subjects covered by former us classification8%
H10NElectric solid-state devices not otherwise provided for6%
C04BLime, magnesia5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
PatentTitleYear
11,084,094Manufacturing apparatus for metal powder and manufacturing method thereof202111,081,266Soft magnetic alloy powder, dust core, and magnetic component202110,991,495Soft magnetic alloy and magnetic component202110,943,718Soft magnetic alloy and magnetic device202110,854,365Soft magnetic alloy and magnetic device202010,847,292Soft magnetic alloy and magnetic device202010,748,688Soft magnetic alloy and magnetic device202010,535,455Soft magnetic alloy and magnetic device20208,498,095'Thin-film capacitor with internally hollow through holes'20138,468,693'Dielectric device and method of manufacturing the same'20138,435,645'Dielectric device and method of manufacturing dielectric device'20138,315,038'Thin-film capacitor and electronic circuit board'20128,294,036'Electronic component and electronic component module'20128,218,287'Thin-film device'20128,149,584'Electronic component and electronic component module'20127,929,272'Thin film capacitor'20117,883,905'Process for producing a BST thin-film capacitor having increased capacity density and reduced leakage current density'20117,808,769'Dielectric device and method of manufacturing the same'20107,581,311'Method for manufacturing a dielectric element'20097,561,406'Nickel substrate thin film capacitor and method of manufacturing nickel substrate thin film capacitor'20097,539,005'Dielectric film production process and capacitor'20097,382,013'Dielectric thin film, dielectric thin film device, and method of production thereof'20086,793,843'Piezoelectric ceramic'20046,411,012'Multilayer piezoelectric element and method of producing the same'20026,384,517'Multilayer piezoelectric device and method of producing same'20026,129,886'Method of preparation of piezoelectric ceramics'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2021Patents assigned to TDK CORP (26)· patent assignee history
2000Based in Akita, JP· patent location history
2002–2021Based in Tokyo, JP· patent location history
2004Based in Narita, JP· patent location history
2008Based in Chuo-ku, JP· patent location history
2012–2013Patents assigned to HORINO KENJI (7)· patent assignee history
2012–2013Patents assigned to SAITA HITOSHI (5)· patent assignee history
2012–2013Patents assigned to OIKAWA YASUNOBU (4)· patent assignee history
2012–2013Patents assigned to KAKEI SHINICHIRO (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TDK CORP | 26 | 2000–2021 |
| HORINO KENJIself | 7 | 2012–2013 |
| SAITA HITOSHI | 5 | 2012–2013 |
| OIKAWA YASUNOBU | 4 | 2012–2013 |
| KAKEI SHINICHIRO | 3 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 23 | 2002–2021 |
| Chuo-ku, JP | 1 | 2008 |
| Narita, JP | 1 | 2004 |
| Akita, JP | 1 | 2000 |