Inventor

Kirk Ostrowski

Inventor
San Jose, CA, US

Overview

7→
Patents
2004–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
H01LSemiconductor devices19%
H01JElectric discharge tubes or discharge lamps14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
C01BNon-metallic elements5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2017Patents assigned to NOVELLUS SYSTEMS INC (6)· patent assignee history
2004–2021Based in San Jose, CA, US· patent location history
2012–2017Patents assigned to CHEUNG DAVID (4)· patent assignee history
2012–2014Patents assigned to OSTROWSKI KIRK J (2)· patent assignee history
2013–2017Patents assigned to OSTROWSKI KIRK (2)· patent assignee history
2013Patents assigned to GUHA ANIRBAN (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NOVELLUS SYSTEMS INC62004–2017
CHEUNG DAVID42012–2017
OSTROWSKI KIRKself22013–2017
OSTROWSKI KIRK Jself22012–2014
GUHA ANIRBAN12013
Locations
LocationPatentsSpan
San Jose, California, US72004–2021