Inventor
Kirk Ostrowski
Inventor
San Jose, CA, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
H01LSemiconductor devices19%
H01JElectric discharge tubes or discharge lamps14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
C01BNon-metallic elements5%
PatentTitleYear
11,062,897Metal doped carbon based hard mask removal in semiconductor fabrication20219,613,825'Photoresist strip processes for improved device integrity'20179,564,344'Ultra low silicon loss high dose implant strip'20178,716,143'Plasma based photoresist removal system for cleaning post ash residue'20148,591,661'Low damage photoresist strip method for low-K dielectrics'20138,129,281'Plasma based photoresist removal system for cleaning post ash residue'20126,693,043'Method for removing photoresist from low-k films in a downstream plasma system'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2017Patents assigned to NOVELLUS SYSTEMS INC (6)· patent assignee history
2004–2021Based in San Jose, CA, US· patent location history
2012–2017Patents assigned to CHEUNG DAVID (4)· patent assignee history
2012–2014Patents assigned to OSTROWSKI KIRK J (2)· patent assignee history
2013–2017Patents assigned to OSTROWSKI KIRK (2)· patent assignee history
2013Patents assigned to GUHA ANIRBAN (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NOVELLUS SYSTEMS INC | 6 | 2004–2017 |
| CHEUNG DAVID | 4 | 2012–2017 |
| OSTROWSKI KIRKself | 2 | 2013–2017 |
| OSTROWSKI KIRK Jself | 2 | 2012–2014 |
| GUHA ANIRBAN | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 7 | 2004–2021 |