Inventor
Ran Namgung
Inventor
Suwon-si, KR
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium5%
C08LCompositions of macromolecular compounds5%
C07CAcyclic or carbocyclic compounds3%
A61KPreparations for medical, dental or toiletry purposes2%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations2%
PatentTitleYear
11,092,890Semiconductor resist composition, and method of forming patterns using the composition202111,092,889Semiconductor resist composition, and method of forming patterns using the composition202111,073,761Semiconductor resist composition, and method of forming patterns using the composition202110,364,221Monomer, organic layer composition, organic layer, and method of forming patterns201910,340,148Polymer, organic layer composition, and method of forming patterns201910,323,124Polymer, organic layer composition, organic layer, and method of forming patterns201910,066,057Organic layer composition, organic layer, and method of forming patterns20189,873,815Polymer, organic layer composition, and method of forming patterns20189,862,668'Monomer, polymer, organic layer composition, organic layer, and method of forming patterns'20189,758,612'Polymer, organic layer composition, organic layer, and method of forming patterns'20179,593,205'Polymer, organic layer composition, organic layer, and method of forming patterns'20179,329,475'Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device'20169,115,057'Conjugate of arm-type polyethyleneglycol with linear polyethyleneimine as gene carrier and synthesis thereof'20158,961,935'MRI contrast agent coated with carboxylated mannan and method for producing the same'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015Patents assigned to KIM WON JONG (2)· patent assignee history
2015Patents assigned to NAMGUNG RAN (2)· patent assignee history
2015Patents assigned to CHO CHONG SU (1)· patent assignee history
2015Based in Gyeonggi-do, KR· patent location history
2015Based in Gyeongsangbuk-do, KR· patent location history
2016Patents assigned to CHEIL IND INC (1)· patent assignee history
2016Based in Uiwang-si, KR· patent location history
2017–2021Patents assigned to SAMSUNG SDI CO LTD (11)· patent assignee history
2017–2021Based in Suwon-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG SDI CO LTD | 11 | 2017–2021 |
| KIM WON JONG | 2 | 2015 |
| NAMGUNG RANself | 2 | 2015 |
| CHEIL IND INC | 1 | 2016 |
| CHO CHONG SU | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwon-si, KR | 11 | 2017–2021 |
| Uiwang-si, KR | 1 | 2016 |
| Gyeonggi-do, KR | 1 | 2015 |
| Gyeongsangbuk-do, KR | 1 | 2015 |