Inventor

KUNTACK LEE

Inventor
KR

Overview

25→
Patents
2021–2026
Patent span
Electricity
Primary field (CPC H)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H01LSemiconductor devices22%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
F26BDrying solid materials or objects by removing liquid therefrom7%
B08BCleaning in general5%
B24BMachines, devices, or processes for grinding or polishing5%
H05BElectric heating5%
B25JManipulators4%
H02JElectric power networks2%
A46BBrushes1%
PatentTitleYear
12,578,647Substrate rotating apparatus, substrate processing system including the same, and substrate processing method using the same202612,523,935Substrate processing method using low temperature developer and semiconductor device manufacturing apparatus using the same202612,463,061Wafer drying apparatus, wafer processing system including the same, and wafer processing method using the same202512,422,754Substrate processing apparatus, semiconductor manufacturing equipment, and substrate processing method202512,420,316Substrate processing apparatus and substrate processing method202512,308,255Apparatus and method for drying substrate202512,278,133Substrate transferring unit, substrate processing apparatus, and substrate processing method202512,225,634Substrate heating apparatus and method for processing a substrate202512,216,408Apparatus for drying wafer and method for drying wafer202512,211,716Substrate processing apparatus and substrate processing method202512,198,923Substrate processing method and substrate processing system202512,057,323Substrate processing method, micropattern forming method, and substrate processing apparatus202411,964,357Conditioner, chemical mechanical polishing apparatus including the same and method of manufacturing a semiconductor device using the apparatus202411,935,772Apparatus for processing a substrate202411,881,426Substrate transferring unit, substrate processing apparatus, and substrate processing method202411,798,801Apparatus including light source supplying light to wafer and window protector receiving a portion of chemical liquid202311,654,458Substrate-cleaning apparatus having tiltable roll brush202311,646,203Thin film formation apparatus and method using plasma202311,640,115Substrate processing apparatus, semiconductor manufacturing equipment, and substrate processing method202311,610,788Process chamber and substrate processing apparatus including the same202311,590,628Rotary body module and chemical mechanical polishing apparatus having the same202311,482,410Apparatus including light source supplying light to wafer and window protector receiving a portion of chemical liquid202211,471,996Conditioner, chemical mechanical polishing apparatus including the same and method of manufacturing a semiconductor device using the apparatus202211,342,203Substrate cleaning apparatus and substrate cleaning method using the same202211,189,503Substrate drying method, photoresist developing method, photolithography method including the same, and substrate drying system2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (25)· patent assignee history
2021–2026Based in KR· patent location history
2025Patents assigned to SEMES CO LTD (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD252021–2026
SEMES CO LTD22025
Locations
LocationPatentsSpan
KR252021–2026