Inventor
YANG-SHAN HUANG
Inventor
NL
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
B01DSeparation7%
F16CShafts7%
H01JElectric discharge tubes or discharge lamps7%
H01LSemiconductor devices7%
H02KDynamo-electric machines7%
H05GX-ray technique7%
H05KPrinted circuits7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
PatentTitleYear
12,332,570Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris202512,032,296Fluid handling system, method and lithographic apparatus202411,961,698Replaceable module for a charged particle apparatus202411,460,786Positioning system and a method for positioning a substage or a stage with respect to a frame202211,442,369Object stage bearing for lithographic apparatus202211,232,960Pick-and-place tool having multiple pick up elements202211,204,558Particle suppression systems and methods202111,175,596Particle traps and barriers for particle suppression202111,137,694Particle suppression systems and methods2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (9)· patent assignee history
2021–2025Patents assigned to ASML HOLDING NV (4)· patent assignee history
2021–2025Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 9 | 2021–2025 |
| ASML HOLDING NV | 4 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 9 | 2021–2025 |