Inventor
Kelly T. Hurley
Inventor
Boise, ID, US
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Bprimary
H10BElectronic memory devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
H10DInorganic electric semiconductor devices13%
C23CCoating metallic material10%
G01BMeasuring length, thickness or similar linear dimensions5%
PatentTitleYear
7,271,435'Modified source/drain re-oxidation method and system'20077,271,060'Semiconductor processing methods'20077,091,087'Optimized flash memory cell'20067,037,860'Modified source/drain re-oxidation method and system'20066,949,792'Stacked gate region of a memory cell in a memory device'20056,808,989'Self-aligned floating gate flash cell system and method'20046,790,721'Metal local interconnect self-aligned source flash cell'20046,759,708'Stacked gate region of a nonvolatile memory cell for a computer'20046,756,268'Modified source/drain re-oxidation method and system'20046,706,594'Optimized flash memory cell'20046,690,051'FLASH memory circuitry'20046,674,145'Flash memory circuitry'20046,653,683'Method and structure for an oxide layer overlying an oxidation-resistant layer'20036,624,022'Method of forming FLASH memory'20036,387,777'Variable temperature LOCOS process'20026,350,708'Silicon nitride deposition method'20026,297,092'Method and structure for an oxide layer overlaying an oxidation-resistant layer'20016,204,206'Silicon nitride deposition method'20016,127,287'Silicon nitride deposition method for use in forming a memory cell dielectric'20005,939,333'Silicon nitride deposition method'19995,899,702'Methods for measuring surface area'19995,578,505'Methods for measuring the surface area of a semiconductor wafer'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2007Patents assigned to MICRON TECHNOLOGY INC (21)· patent assignee history
1996–2007Based in Boise, ID, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 21 | 1996–2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 22 | 1996–2007 |