Inventor
Libor Vyklicky
Inventor
Yorktown Heights, NY, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
H10KOrganic electric solid-state devices6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B01DSeparation3%
C07BGeneral methods of organic chemistry3%
C07DHeterocyclic compounds3%
PatentTitleYear
9,981,965Process for preparing idelalisib20189,726,977'Coating compositions suitable for use with an overcoated photoresist'20179,465,290'Near-infrared absorbing film compositions'20169,012,133'Removal of alkaline crystal defects in lithographic patterning'20158,772,376'Near-infrared absorbing film compositions'20148,652,762'Organic graded spin on BARC compositions for high NA lithography'20148,586,283'Near-infrared absorbing film compositions'20138,557,501'Developable bottom antireflective coating compositions especially suitable for ion implant applications'20138,546,062'Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same'20138,293,451'Near-infrared absorbing film compositions'20128,182,978'Developable bottom antireflective coating compositions especially suitable for ion implant applications'20128,137,874'Organic graded spin on BARC compositions for high NA lithography'20128,097,401'Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same'20127,816,069'Graded spin-on organic antireflective coating for photolithography'20107,588,879'Graded spin-on organic antireflective coating for photolithography'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2015Patents assigned to IBM (12)· patent assignee history
2009–2017Based in Yorktown Heights, NY, US· patent location history
2012–2017Patents assigned to VYKLICKY LIBOR (11)· patent assignee history
2012–2014Patents assigned to HUANG WU-SONG (7)· patent assignee history
2012–2015Patents assigned to GOLDFARB DARIO L (6)· patent assignee history
2012–2013Patents assigned to VARANASI PUSHKARA RAO (4)· patent assignee history
2016Based in Brno, CZ· patent location history
2018Based in Blansko, CZ· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 12 | 2009–2015 |
| VYKLICKY LIBORself | 11 | 2012–2017 |
| HUANG WU-SONG | 7 | 2012–2014 |
| GOLDFARB DARIO L | 6 | 2012–2015 |
| VARANASI PUSHKARA RAO | 4 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yorktown Heights, New York, US | 13 | 2009–2017 |
| Blansko, CZ | 1 | 2018 |
| Brno, CZ | 1 | 2016 |