Inventor

Kazumasa Wakiya

Inventor

Kanagawa, JP

Overview

41→

Patents

1990–2016

Patent span

Physics

Primary field (CPC G)

Patents· 41 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices52%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%

C11DDetergent compositions10%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds1%

C08LCompositions of macromolecular compounds1%

C09KMaterials for miscellaneous applications, not provided for elsewhere1%

H01LSemiconductor devices1%

Y10TTechnical subjects covered by former us classification1%

PatentTitleYear

9,244,358'Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate'2016 8,697,345'Photoresist stripping solution and a method of stripping photoresists using the same'2014 8,685,910'Cleaning liquid used in photolithography and a method for treating substrate therewith'2014 8,367,312'Detergent for lithography and method of forming resist pattern with the same'2013 8,354,215'Method for stripping photoresist'2013 8,192,923'Photoresist stripping solution and a method of stripping photoresists using the same'2012 8,158,568'Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith'2012 8,124,312'Method for forming pattern, and material for forming coating film'2012 7,897,325'Lithographic rinse solution and method for forming patterned resist layer using the same'2011 7,846,637'Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film'2010 7,811,748'Resist pattern forming method and composite rinse agent'2010 7,795,197'Cleaning liquid for lithography and method for resist pattern formation'2010 7,741,260'Rinsing fluid for lithography'2010 7,442,675'Cleaning composition and method of cleaning semiconductor substrate'2008 7,371,510'Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern'2008 7,238,462'Undercoating material for wiring, embedded material, and wiring formation method'2007 7,179,399'Material for forming protective film'2007 7,129,020'Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern'2006 6,815,151'Rinsing solution for lithography and method for processing substrate with the use of the same'2004 6,746,963'Method for processing coating film and method for manufacturing semiconductor element with use of the same method'2004 6,734,258'Protective coating composition for dual damascene process'2004 6,689,535'Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern'2004 6,638,899'Photoresist stripping solution and a method of stripping photoresists with the same'2003 6,599,682'Method for forming a finely patterned photoresist layer'2003 6,416,930'Composition for lithographic anti-reflection coating, and resist laminate using the same'2002 6,291,142'Photoresist stripping liquid compositions and a method of stripping photoresists using the same'2001 6,261,745'Post-ashing treating liquid compositions and a process for treatment therewith'2001 6,225,030'Post-ashing treating method for substrates'2001 6,225,034'Photoresist stripping liquid compositions and a method of stripping photoresists using the same'2001 6,218,087'Photoresist stripping liquid composition and a method of stripping photoresists using the same'2001 6,136,505'Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film'2000 6,132,928'Coating solution for forming antireflective coating film'2000 6,068,000'Substrate treatment method'2000 5,968,848'Process for treating a lithographic substrate and a rinse solution for the treatment'1999 5,905,063'Remover solution composition for resist and method for removing resist using the same'1999 5,863,710'Developer solution for photolithographic patterning'1999 5,795,702'Photoresist stripping liquid compositions and a method of stripping photoresists using the same'1998 5,792,274'Remover solution composition for resist and method for removing resist using the same'1998 5,783,362'Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition'1998 5,631,314'Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition'1997 4,944,893'Remover solution for resist'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–2016Patents assigned to TOKYO OHKA KOGYO CO LTD (40)· patent assignee history

1990Based in Samukawa, JP· patent location history

1997–2014Based in Kanagawa, JP· patent location history

1999Based in Fujisawa, JP· patent location history

2003–2004Based in Chigasaki, JP· patent location history

2008–2016Based in Kawasaki, JP· patent location history

2012–2016Patents assigned to WAKIYA KAZUMASA (8)· patent assignee history

2012–2014Patents assigned to YOKOI SHIGERU (5)· patent assignee history

2012–2016Patents assigned to KOSHIYAMA JUN (3)· patent assignee history

2013Patents assigned to HARAGUCHI TAKAYUKI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO OHKA KOGYO CO LTD	40	1990–2016
WAKIYA KAZUMASAself	8	2012–2016
YOKOI SHIGERU	5	2012–2014
KOSHIYAMA JUN	3	2012–2016
HARAGUCHI TAKAYUKI	1	2013

Locations

Location	Patents	Span
Kanagawa, JP	29	1997–2014
Kawasaki, JP	8	2008–2016
Chigasaki, JP	2	2003–2004
Fujisawa, JP	1	1999
Samukawa, JP	1	1990