Inventor
William G. Easter
Inventor
Orlando, FL, US
Overview
Patents· 57 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
B24DTools for grinding, buffing or sharpening6%
B08BCleaning in general4%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
H01RElectrically-conductive connections3%
G06FElectric digital data processing2%
H04QSelecting2%
PatentTitleYear
7,160,493'Retaining ring for use on a carrier of a polishing apparatus'20076,750,145'Method of eliminating agglomerate particles in a polishing slurry'20046,730,603'System and method of determining a polishing endpoint by monitoring signal intensity'20046,728,364'Analog phone bank connector'20046,726,537'Polishing carrier head'20046,615,433'Apparatus for detecting wetness of a semiconductor wafer cleaning brush'20036,596,639'Method for chemical/mechanical planarization of a semiconductor wafer having dissimilar metal pattern densities'20036,579,797'Cleaning brush conditioning apparatus'20036,558,238'Apparatus and method for reclamation of used polishing slurry'20036,551,410'Method of cleaning a semiconductor wafer with a cleaning brush assembly having a contractible and expandable arbor'20036,537,135'Curvilinear chemical mechanical planarization device and method'20036,517,416'Chemical mechanical polisher including a pad conditioner and a method of manufacturing an integrated circuit using the chemical mechanical polisher'20036,518,987'Mouse and mouse template for a motion impaired user'20036,514,123'Semiconductor polishing pad alignment device for a polishing apparatus and method of use'20036,508,363'Slurry container'20036,462,305'Method of manufacturing a polishing pad using a beam'20026,423,149'Apparatus and method for gradient cleaning of semiconductor wafers'20026,402,599'Slurry recirculation system for reduced slurry drying'20026,373,945'Terminal block extension for greater wire packing efficiency'20026,369,799'Computer pointer device for handicapped persons'20026,368,190'Electrochemical mechanical planarization apparatus and method'20026,368,955'Method of polishing semiconductor structures using a two-step chemical mechanical planarization with slurry particles having different particle bulk densities'20026,355,184'Method of eliminating agglomerate particles in a polishing slurry'20026,354,910'Apparatus and method for in-situ measurement of polishing pad thickness loss'20026,354,928'Polishing apparatus with carrier ring and carrier head employing like polarities'20026,299,519'Apparatus and method for removing a polishing pad from a platen'20016,293,847'Apparatus for chemical mechanical polishing endpoint detection using a hydrogen sensor'20016,290,883'Method for making porous CMP article'20016,288,648'Apparatus and method for determining a need to change a polishing pad conditioning wheel'20016,287,173'Longer lifetime warm-up wafers for polishing systems'20016,281,129'Corrosion-resistant polishing pad conditioner'20016,264,536'Reducing polish platen corrosion during integrated circuit fabrication'20016,258,231'Chemical mechanical polishing endpoint apparatus using component activity in effluent slurry'20016,254,454'Reference thickness endpoint techniques for polishing operations'20016,234,868'Apparatus and method for conditioning a polishing pad'20016,214,732'Chemical mechanical polishing endpoint detection by monitoring component activity in effluent slurry'20016,206,770'Wafer carrier head for prevention of unintentional semiconductor wafer rotation'20016,202,295'Method and tool that removes an electrical connecting block from a telecommunications board'20016,183,652'Method for removing microorganism contamination from a polishing slurry'20016,161,278'Method for inserting wires into a telephone jack connector'20006,150,271'Differential temperature control in chemical mechanical polishing processes'20006,121,142'Magnetic frictionless gimbal for a polishing apparatus'20006,093,086'Polishing head release mechanism'20006,080,671'Process of chemical-mechanical polishing and manufacturing an integrated circuit'20006,059,638'Magnetic force carrier and ring for a polishing apparatus'20006,024,829'Method of reducing agglomerate particles in a polishing slurry'20005,967,885'Method of manufacturing an integrated circuit using chemical mechanical polishing'19995,951,382'Chemical mechanical polishing carrier fixture and system'19995,892,292'Getterer for multi-layer wafers and method for making same'19995,478,758'Method of making a getterer for multi-layer wafers'19955,366,924'Method of manufacturing an integrated circuit including planarizing a wafer'1994H0001174'Wafer bonded dielectrically isolated structures'1993H0001137'Wafer bonding technique for dielectric isolation processing'19934,987,471'High-speed dielectrically isolated devices utilizing buried silicide regions'19914,870,029'Method of forming complementary device structures in partially processed dielectrically isolated wafers'19894,839,309'Fabrication of high-speed dielectrically isolated devices utilizing buried silicide outdiffusion'19894,820,653'Technique for fabricating complementary dielectrically isolated wafer'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989Patents assigned to AMERICAN TELEPHONE & TELEGRAPH (3)· patent assignee history
1989–1994Patents assigned to AT & T BELL LAB (3)· patent assignee history
1989–1993Based in Reading, PA, US· patent location history
1994–1999Based in Wernersville, PA, US· patent location history
1999–2003Patents assigned to LUCENT TECHNOLOGIES INC (22)· patent assignee history
1999–2004Based in Orlando, FL, US· patent location history
2001–2002Patents assigned to AGERE SYST GUARDIAN CORP (12)· patent assignee history
2002–2004Patents assigned to AGERE SYSTEMS INC (14)· patent assignee history
2007Based in Chuluota, FL, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LUCENT TECHNOLOGIES INC | 22 | 1999–2003 |
| AGERE SYSTEMS INC | 14 | 2002–2004 |
| AGERE SYST GUARDIAN CORP | 12 | 2001–2002 |
| AMERICAN TELEPHONE & TELEGRAPH | 3 | 1989 |
| AT & T BELL LAB | 3 | 1989–1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| Orlando, Florida, US | 47 | 1999–2004 |
| Reading, Pennsylvania, US | 6 | 1989–1993 |
| Wernersville, Pennsylvania, US | 3 | 1994–1999 |
| Chuluota, Florida, US | 1 | 2007 |