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Inventor

Rainer Butsch

Inventor
Fairport, NY, US

Overview

3→
Patents
1998–1999
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary
B82YSpecific uses or applications of nanostructures38%
H01JElectric discharge tubes or discharge lamps38%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
PatentTitleYear
5,916,716'Emulation methodology for critical dimension control in E-Beam lithography'19995,838,013'Method for monitoring resist charging in a charged particle system'19985,798,528'Correction of pattern dependent position errors in electron beam lithography'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–1999Patents assigned to IBM (3)· patent assignee history
1998–1999Based in Fairport, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM31998–1999
Locations
LocationPatentsSpan
Fairport, New York, US31998–1999