Inventor
Hiroshi HANEKAWA
Inventor
JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices79%
C23CCoating metallic material7%
H01LSemiconductor devices7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
PatentTitleYear
12,235,575Reflective mask blank for EUV lithography and substrate with conductive film202512,216,398Reflective mask blank and reflective mask202512,124,164Reflective mask blank and reflective mask202412,038,685Reflective mask blank for EUV lithography202412,032,280Reflective mask blank, reflective mask, and method for manufacturing reflective mask202411,982,935Reflective mask blank for EUV lithography202411,934,093Reflective mask blank for EUV lithography and substrate with conductive film202411,914,283Reflective mask blank and reflective mask202411,703,751Reflective mask blank and reflective mask202311,698,580Reflective mask blank for EUV lithography202311,150,550Reflective mask blank and reflective mask2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to AGC INC (11)· patent assignee history
2021–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGC INC | 11 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 11 | 2021–2025 |