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Inventor

Joshua E. Byrne

Inventor
Los Altos, CA, US

Overview

3→
Patents
1998–2000
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material30%
H01JElectric discharge tubes or discharge lamps30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
Y10TTechnical subjects covered by former us classification20%
PatentTitleYear
6,051,284'Chamber monitoring and adjustment by plasma RF metrology'20005,811,195'Corrosion-resistant aluminum article for semiconductor processing equipment'19985,756,222'Corrosion-resistant aluminum article for semiconductor processing equipment'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2000Patents assigned to APPLIED MATERIALS INC (3)· patent assignee history
1998–2000Based in Los Altos, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC31998–2000
Locations
LocationPatentsSpan
Los Altos, California, US31998–2000