Inventor
Mona M. Eissa
Inventor
Plano, TX, US
Overview
Patents· 31 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1021%
G01RMeasuring electric variables8%
C23FNon-mechanical removal of metallic material from surface7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
H01LSemiconductor devices5%
H10BElectronic memory devices4%
H10DInorganic electric semiconductor devices4%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems2%
C09KMaterials for miscellaneous applications, not provided for elsewhere2%
PatentTitleYear
11,075,157IC having trench-based metal-insulator-metal capacitor202110,718,826High performance fluxgate device202010,663,534High performance fluxgate device202010,266,950Process for NiFe fluxgate device201910,199,573Magnetic core201910,017,851Magnetic field annealing for integrated fluxgate sensors201810,005,662Selective patterning of titanium encapsulation layers20189,840,781'Process for NiFe fluxgate device'20179,771,261'Selective patterning of an integrated fluxgate device'20178,288,283'Aluminum enhanced palladium CMP process'20127,833,895'TSVS having chemically exposed TSV tips for integrated circuit devices'20107,354,853'Selective dry etching of tantalum and tantalum nitride'20087,268,073'Post-polish treatment for inhibiting copper corrosion'20077,232,768'Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials'20077,179,751'Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials'20077,153,782'Effective solution and process to wet-etch metal-alloy films in semiconductor processing'20066,997,192'Control of dissolved gas levels in deionized water'20066,967,173'Hydrogen plasma photoresist strip and polymeric residue cleanup processs for low dielectric constant materials'20056,939,795'Selective dry etching of tantalum and tantalum nitride'20056,806,193'CMP in-situ conditioning with pad and retaining ring clean'20046,723,658'Gate structure and method'20046,624,086'Effective solution and process to wet-etch metal-alloy films in semiconductor processing'20036,605,536'Treatment of low-k dielectric films to enable patterning of deep submicron features'20036,579,798'Processes for chemical-mechanical polishing of a semiconductor wafer'20036,551,943'Wet clean of organic silicate glass films'20036,383,928'Post copper CMP clean'20026,316,350'Post fuse slag etch'20016,150,010'Integrated circuit insulator'20006,030,706'Integrated circuit insulator and method'20005,888,905'Integrated circuit insulator and method'19995,828,132'Semiconductor device having perfluorinated and non-fluorinated parylene intermetal dielectric'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2021Patents assigned to TEXAS INSTRUMENTS INC (30)· patent assignee history
1998–2008Based in Plano, TX, US· patent location history
2007–2021Based in Allen, TX, US· patent location history
2012Patents assigned to EISSA MONA M (1)· patent assignee history
2012Patents assigned to ZINN BRIAN E (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TEXAS INSTRUMENTS INC | 30 | 1998–2021 |
| EISSA MONA Mself | 1 | 2012 |
| ZINN BRIAN E | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Plano, Texas, US | 19 | 1998–2008 |
| Allen, Texas, US | 12 | 2007–2021 |