Inventor

Hiroshi Iwata

Inventor
Tokyo, JP

Overview

10→
Patents
1993–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

A61Kprimary
A61KPreparations for medical, dental or toiletry purposes11%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations11%
B29CShaping or joining of plastics8%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts5%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering5%
C07CAcyclic or carbocyclic compounds5%
C07DHeterocyclic compounds5%
C08JWorking-up5%
B23KSoldering or unsoldering3%
B26DCutting3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–1994Based in Osaka, JP· patent location history
2021Patents assigned to IWATA HIROSHI (2)· patent assignee history
2021Patents assigned to MATSUMURA TAKASHI (2)· patent assignee history
2021Patents assigned to NIIMI TATSUYA (2)· patent assignee history
2021Patents assigned to NORIKANE YOSHIHIRO (2)· patent assignee history
2021Patents assigned to RICOH CO LTD (2)· patent assignee history
2021Based in Tokyo, JP· patent location history
2021Based in Kiyosu, JP· patent location history
2021Based in Sakai, JP· patent location history
2021Based in Aichi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IWATA HIROSHIself22021
MATSUMURA TAKASHI22021
NIIMI TATSUYA22021
NORIKANE YOSHIHIRO22021
RICOH CO LTD22021
Locations
LocationPatentsSpan
Tokyo, JP22021
Osaka, JP21993–1994
Kiyosu, JP12021
Sakai, JP12021
Aichi, JP12021