Inventor
Yasunori Yokoya
Inventor
Shinjuku-ku, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
8,802,334'Surface treatment method for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask'20147,713,663'Mask blank, manufacturing method of mask blank, manufacturing method of transfer mask and manufacturing method of semiconductor device'20105,723,237'Method for determining baking conditions for resist pattern formation through development of unexposed trial resist films'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2014Patents assigned to HOYA CORP (3)· patent assignee history
1998Based in Yamanashi, JP· patent location history
2010Based in Tokyo, JP· patent location history
2014Patents assigned to HASHIMOTO MASAHIRO (1)· patent assignee history
2014Patents assigned to SUZUKI TOSHIYUKI (1)· patent assignee history
2014Patents assigned to YAMADA TAKEYUKI (1)· patent assignee history
2014Patents assigned to YOKOYA YASUNORI (1)· patent assignee history
2014Based in Shinjuku-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOYA CORP | 3 | 1998–2014 |
| HASHIMOTO MASAHIRO | 1 | 2014 |
| SUZUKI TOSHIYUKI | 1 | 2014 |
| YAMADA TAKEYUKI | 1 | 2014 |
| YOKOYA YASUNORIself | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shinjuku-ku, JP | 1 | 2014 |
| Tokyo, JP | 1 | 2010 |
| Yamanashi, JP | 1 | 1998 |