Inventor
SOSUKE OSAWA
Inventor
JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds19%
C09DCoating compositions, e.g. paints, varnishes or lacquers19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
B05DProcesses for applying fluent materials to surfaces, in general6%
C08JWorking-up6%
C08LCompositions of macromolecular compounds6%
H01LSemiconductor devices6%
PatentTitleYear
12,372,869Method for forming resist pattern and radiation-sensitive resin composition202511,745,216Method for producing film202311,687,003Negative resist pattern-forming method, and composition for upper layer film formation202311,603,459Resin composition and method of forming resist pattern202311,340,528Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to JSR CORP (5)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 5 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 5 | 2022–2025 |