Inventor

Weihong Li

Inventor
Boise, ID, US

Overview

8→
Patents
2000–2016
Patent span
General tagging of new technological developments
Primary field (CPC Y)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Mprimary
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy26%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution26%
Y10TTechnical subjects covered by former us classification21%
A47LDomestic washing or cleaning5%
A61BDiagnosis5%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling5%
G06FElectric digital data processing5%
Y02PClimate change mitigation technologies in the production or processing of goods5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2001Patents assigned to MICRON TECHNOLOGY INC (5)· patent assignee history
2000Based in Boise, ID, US· patent location history
2001Based in North Ridgeville, OH, US· patent location history
2010Patents assigned to BEIJING SECOND OPTICAL INSTRUM (1)· patent assignee history
2010Based in Beijing, CN· patent location history
2013–2016Patents assigned to LI WEIHONG (2)· patent assignee history
2013Based in Plainsboro, NJ, US· patent location history
2016Patents assigned to BOSCH GMBH ROBERT (1)· patent assignee history
2016Patents assigned to CHEN XUEJING (1)· patent assignee history
2016Based in Hangzhou, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MICRON TECHNOLOGY INC52000–2001
LI WEIHONGself22013–2016
BEIJING SECOND OPTICAL INSTRUM12010
BOSCH GMBH ROBERT12016
CHEN XUEJING12016
Locations
LocationPatentsSpan
Boise, ID, US32000
North Ridgeville, OH, US22001
Hangzhou, CN12016
Plainsboro, New Jersey, US12013
Beijing, CN12010