Inventor

David C. Brandt

Inventor

Escondido, CA, US

Overview

1998–2020

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H05Gprimary

H05GX-ray technique33%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%

G21KHandling of particles or ionising radiation not otherwise provided for11%

G02BOptical elements, systems or apparatus7%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

B82YSpecific uses or applications of nanostructures4%

F04CRotary-piston, or oscillating-piston, positive-displacement machines for liquids4%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1998Based in Claremore, OK, US· patent location history

2010–2012Patents assigned to CYMER INC (6)· patent assignee history

2010–2017Based in Escondido, CA, US· patent location history

2012–2017Patents assigned to FOMENKOV IGOR V (3)· patent assignee history

2012–2017Patents assigned to BRANDT DAVID C (2)· patent assignee history

2012–2017Patents assigned to BYKANOV ALEXANDER N (2)· patent assignee history

2017–2020Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history

2017–2020Based in San Diego, CA, US· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations