Inventor
Tomohiro Sakazaki
Inventor
Kasugai, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B82Yprimary
B82YSpecific uses or applications of nanostructures50%
H01JElectric discharge tubes or discharge lamps50%
PatentTitleYear
8,466,439'Electron beam lithography apparatus and electron beam lithography method'20136,344,655'Multicolumn charged-particle beam lithography system'20026,242,751'Charged-particle-beam exposure device and charged-particle-beam exposure method'20015,969,365'Charged-particle-beam exposure device and charged-particle-beam exposure method'19995,757,015'Charged-particle-beam exposure device and charged-particle-beam exposure method'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2001Patents assigned to FUJITSU LTD (3)· patent assignee history
1998–2001Based in Kasugai, JP· patent location history
2002–2013Patents assigned to ADVANTEST CORP (2)· patent assignee history
2002–2013Based in Tokyo, JP· patent location history
2013Patents assigned to SAKAZAKI TOMOHIRO (1)· patent assignee history
2013Patents assigned to YAMADA AKIO (1)· patent assignee history
2013Patents assigned to YASUDA HIROSHI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJITSU LTD | 3 | 1998–2001 |
| ADVANTEST CORP | 2 | 2002–2013 |
| SAKAZAKI TOMOHIROself | 1 | 2013 |
| YAMADA AKIO | 1 | 2013 |
| YASUDA HIROSHI | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kasugai, JP | 3 | 1998–2001 |
| Tokyo, JP | 2 | 2002–2013 |