Inventor
Toshikazu Karino
Inventor
Tokyo, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests40%
C23CCoating metallic material20%
PatentTitleYear
6,143,083'Substrate transferring mechanism'20006,066,210'Substrate processing apparatus with a processing chamber, transfer chamber, intermediate holding chamber, and an atmospheric pressure section'20005,788,447'Substrate processing apparatus'19985,387,265'Semiconductor wafer reaction furnace with wafer transfer means'19955,217,340'Wafer transfer mechanism in vertical CVD diffusion apparatus'19935,112,641'Wafer transfer method in vertical CVD diffusion apparatus'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–2000Patents assigned to KOKUSAI ELECTRIC CO LTD (6)· patent assignee history
1992–1993Based in Higashimurayama, JP· patent location history
1995–2000Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KOKUSAI ELECTRIC CO LTD | 6 | 1992–2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 4 | 1995–2000 |
| Higashimurayama, JP | 2 | 1992–1993 |