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Inventor

Junichi Arami

Inventor
Tokyo, JP

Overview

34→
Patents
1993–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 34 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
H01JElectric discharge tubes or discharge lamps18%
C23CCoating metallic material16%
H02NElectric machines not otherwise provided for5%
H01LSemiconductor devices4%
H05BElectric heating4%
Y10TTechnical subjects covered by former us classification4%
H05HPlasma technique3%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry1%
B08BCleaning in general1%
PatentTitleYear
11,088,012Wafer susceptor apparatus with thermal insulation and method for manufacturing the same20219,653,357'Plasma etching apparatus'20179,379,015'Wafer processing method'20167,717,061'Gas switching mechanism for plasma processing apparatus'20107,658,801'Heat treatment apparatus'20107,481,902'Substrate processing apparatus and method, high speed rotary valve and cleaning method'20097,273,526'Thin-film deposition apparatus'20076,764,575'Magnetron plasma processing apparatus'20046,156,151'Plasma processing apparatus'20006,062,810'Turbomolecular pump'20006,035,804'Process chamber apparatus'20006,014,943'Plasma process device'20005,958,140'One-by-one type heat-processing apparatus'19995,938,850'Single wafer heat treatment apparatus'19995,904,872'Heating device, method of manufacturing the same, and processing apparatus using the same'19995,888,338'Magnetron plasma processing apparatus and processing method'19995,665,260'Ceramic electrostatic chuck with built-in heater'19975,660,671'Magnetron plasma processing apparatus and processing method'19975,618,350'Processing apparatus'19975,591,269'Vacuum processing apparatus'19975,575,853'Vacuum exhaust system for processing apparatus'19965,566,043'Ceramic electrostatic chuck with built-in heater'19965,542,559'Plasma treatment apparatus'19965,539,179'Electrostatic chuck having a multilayer structure for attracting an object'19965,474,643'Plasma processing apparatus'19955,387,893'Permanent magnet magnetic circuit and magnetron plasma processing apparatus'19955,376,211'Magnetron plasma processing apparatus and processing method'19945,290,381'Plasma etching apparatus'19945,275,683'Mount for supporting substrates and plasma processing apparatus using the same'19945,255,153'Electrostatic chuck and plasma apparatus equipped therewith'19935,250,137'Plasma treating apparatus'19935,240,556'Surface-heating apparatus and surface-treating method'19935,234,527'Liquid level detecting device and a processing apparatus'19935,221,403'Support table for plate-like body and processing apparatus using the table'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2010Patents assigned to TOKYO ELECTRON LTD (28)· patent assignee history
1993–1999Patents assigned to TOSHIBA KK (10)· patent assignee history
1993–2017Based in Tokyo, JP· patent location history
1993–1995Based in Hachioji, JP· patent location history
1996–2004Patents assigned to SHINETSU CHEMICAL CO (6)· patent assignee history
1996–1997Patents assigned to TOKYO ELECTORON LIMITED (2)· patent assignee history
1996–1999Based in Shinjuku-ku, JP· patent location history
2009Based in Nirasaki, JP· patent location history
2016–2017Patents assigned to DISCO CORP (2)· patent assignee history
2021Based in Shenyang, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD281993–2010
TOSHIBA KK101993–1999
SHINETSU CHEMICAL CO61996–2004
DISCO CORP22016–2017
TOKYO ELECTORON LIMITED21996–1997
Locations
LocationPatentsSpan
Tokyo, JP231993–2017
Hachioji, JP51993–1995
Shinjuku-ku, JP21996–1999
Shenyang, CN12021
Nirasaki, JP12009