Inventor
Masaru Kobashi
Inventor
Matsumoto, JP
Overview
Patents· 41 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B41Jprimary
B41JTypewriters55%
G03GElectrography29%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
B05BSpraying apparatus2%
B21HMaking particular metal objects by rolling, e.g. screws, wheels, rings, barrels, balls2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
Y10TTechnical subjects covered by former us classification2%
PatentTitleYear
10,518,535Liquid ejecting apparatus201910,391,773Liquid ejecting apparatus201910,328,719Liquid ejecting apparatus20199,555,637'Cartridge and liquid supplying method'20179,498,954'Ink jet recording apparatus and ink jet recording method'20169,375,931'Liquid receiving apparatus, liquid ejecting apparatus, and method of discharging liquid'20169,375,933'Liquid ejecting apparatus'20169,375,932'Liquid ejecting apparatus'20169,334,412'Ink composition for ink jet recording, ink supply system, and ink jet recording apparatus'20169,233,556'Ink jet recording apparatus and ink jet recording method'20169,193,882'Ink composition for ink jet recording, ink supply system, and ink jet recording apparatus'20159,023,154'Cleaning method, cleaning apparatus, and liquid ejecting apparatus'20158,991,987'Fluid ejecting apparatus and cleaning method'20158,708,453'Cleaning method and fluid ejecting apparatus'20148,702,213'Liquid holding container and liquid consuming apparatus'20148,651,620'Ejection liquid dryness suppressing device, liquid ejecting apparatus, and ejection liquid dryness suppressing method'20148,651,647'Liquid ejecting apparatus, and nozzle recovery method used in liquid ejecting apparatus'20148,632,164'Liquid ejecting apparatus'20148,550,600'Liquid ejecting apparatus'20138,534,808'Liquid ejecting apparatus and cleaning method in liquid ejecting apparatus'20138,526,855'Image forming apparatus and image forming method'20138,491,088'Maintenance apparatus, liquid ejecting apparatus, and maintenance method'20138,465,121'Fluid ejecting apparatus and wiping method'20138,449,063'Liquid ejecting apparatus'20138,439,479'Liquid ejecting apparatus'20138,425,015'Liquid ejecting apparatus'20138,412,080'Developing roller manufacturing method, developing roller, developing device, and image forming apparatus'20138,382,240'Liquid ejecting apparatus'20138,382,252'Liquid ejecting apparatus with an electric potential control unit'20138,295,723'Image forming apparatus and image forming method with improved protective agent properties'20128,175,497'Image forming apparatus applying protective agent'20128,175,498'Image forming apparatus and method that charges latent image carrier'20128,019,249'Charging device, image forming apparatus and method of charging image carrier of image forming apparatus'20117,965,965'Development device and image forming apparatus'20117,929,880'Cleaning blade anti-peeling apparatus, image forming apparatus, and cleaning blade anti-peeling method'20117,904,012'Image carrier cleaning device, image carrier cleaning method, and image forming apparatus'20117,835,655'Charger, image forming apparatus, and charge control method'20107,639,960'Charger, image forming apparatus, and charge control method'20097,460,815'Charge roller for noncontact charging across a charge gap, method for producing the same, and image-forming apparatus including the same'20087,449,271'Electrophotographic photoconductor and methods therefor'20086,723,480'Substrate for electrophotography photosensitive body, electrophotography photosensitive body, and electrophotography device'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2017Based in Nagano, JP· patent location history
2008–2019Patents assigned to SEIKO EPSON CORP (39)· patent assignee history
2008–2014Based in Suwa, JP· patent location history
2009–2019Based in Matsumoto, JP· patent location history
2012–2015Patents assigned to KOBASHI MASARU (19)· patent assignee history
2012–2015Patents assigned to YAMADA YOICHI (17)· patent assignee history
2013–2015Patents assigned to MATSUMOTO DAISUKE (9)· patent assignee history
2013Patents assigned to KATSUKI KIYOTERU (7)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO EPSON CORP | 39 | 2008–2019 |
| KOBASHI MASARUself | 19 | 2012–2015 |
| YAMADA YOICHI | 17 | 2012–2015 |
| MATSUMOTO DAISUKE | 9 | 2013–2015 |
| KATSUKI KIYOTERU | 7 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Matsumoto, JP | 35 | 2009–2019 |
| Nagano, JP | 4 | 2004–2017 |
| Suwa, JP | 2 | 2008–2014 |