Inventor

Erik M. Freer

Inventor
Campbell, CA, US

Overview

22→
Patents
2010–2016
Patent span
Chemistry
Primary field (CPC C)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
B08BCleaning in general16%
C11DDetergent compositions14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis12%
B05DProcesses for applying fluent materials to surfaces, in general8%
B82YSpecific uses or applications of nanostructures2%
C25DProcesses for the electrolytic or electrophoretic production of coatings2%
H01LSemiconductor devices2%
H05KPrinted circuits2%
PatentTitleYear
9,390,951'Methods and systems for electric field deposition of nanowires and other devices'20168,716,210'Material for cleaning a substrate'20148,608,859'Method for removing contamination from a substrate and for making a cleaning solution'20138,591,662'Methods for cleaning a semiconductor substrate'20138,590,550'Apparatus for cleaning contaminants from substrate'20138,555,903'Method and apparatus for removing contamination from substrate'20138,522,801'Method and apparatus for cleaning a semiconductor substrate'20138,522,799'Apparatus and system for cleaning a substrate'20138,480,810'Method and apparatus for particle removal'20138,475,599'Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions'20138,388,762'Substrate cleaning technique employing multi-phase solution'20138,316,866'Method and apparatus for cleaning a semiconductor substrate'20128,242,067'Two-phase substrate cleaning material'20128,137,474'Cleaning compound and method and system for using the cleaning compound'20127,975,708'Proximity head with angled vacuum conduit system, apparatus and method'20117,897,213'Methods for contained chemical surface treatment'20117,892,610'Method and system for printing aligned nanowires and other electrical devices'20117,862,662'Method and material for cleaning a substrate'20117,799,141'Method and system for using a two-phases substrate cleaning compound'20107,737,097'Method for removing contamination from a substrate and for making a cleaning solution'20107,696,141'Cleaning compound and method and system for using the cleaning compound'20107,648,584'Method and apparatus for removing contamination from substrate'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2014Patents assigned to LAM RES CORP (20)· patent assignee history
2010–2016Based in Campbell, CA, US· patent location history
2011Based in Camptell, CA, US· patent location history
2012–2014Patents assigned to FREER ERIK M (13)· patent assignee history
2012–2014Patents assigned to KOROLIK MIKHAIL (13)· patent assignee history
2012–2014Patents assigned to MIKHAYLICHENKO KATRINA (12)· patent assignee history
2012–2014Patents assigned to RAVKIN MICHAEL (11)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LAM RES CORP202010–2014
FREER ERIK Mself132012–2014
KOROLIK MIKHAIL132012–2014
MIKHAYLICHENKO KATRINA122012–2014
RAVKIN MICHAEL112012–2014
Locations
LocationPatentsSpan
Campbell, California, US212010–2016
Camptell, California, US12011