Inventor
Taichi Yonemoto
Inventor
Isehara, JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B41Jprimary
B41JTypewriters48%
Y10TTechnical subjects covered by former us classification15%
H01LSemiconductor devices10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
C09KMaterials for miscellaneous applications, not provided for elsewhere5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
C02FTreatment of water, waste water, sewage, or sludge3%
C23FNon-mechanical removal of metallic material from surface3%
H01JElectric discharge tubes or discharge lamps3%
H10DInorganic electric semiconductor devices3%
PatentTitleYear
11,081,349Method of forming film on substrate and method of manufacturing liquid ejection head20219,799,526'Liquid composition and etching method for etching silicon substrate'20179,669,628'Liquid ejection head substrate, method of manufacturing the same, and method of processing silicon substrate'20179,472,639'Forming a liquid ejection head with through holes and a depression'20169,333,749'Method for manufacturing liquid ejection head substrate'20168,993,357'Method for manufacturing liquid discharge head'20158,771,531'Method of producing substrate for liquid ejection head'20148,673,660'Method of producing liquid ejection head'20148,492,281'Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate'20138,435,805'Method of manufacturing a substrate for liquid ejection head'20138,329,047'Method for producing liquid discharge head'20128,323,519'Method for manufacturing liquid discharge head'20128,287,747'Method of processing silicon substrate and method of manufacturing substrate for liquid discharge head'20128,147,034'Liquid discharge recording head and recording apparatus'20128,148,049'Ink jet recording head and manufacturing method of the same'20128,128,204'Liquid ejection head and method for manufacturing liquid ejection head'20128,091,233'Method of manufacturing liquid discharge head'20128,047,632'Ink jet recording head'20118,037,603'Ink jet head and producing method therefor'20117,891,784'Liquid ejection head and method for manufacturing liquid ejection head'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2021Patents assigned to CANON KK (20)· patent assignee history
2011–2021Based in Isehara, JP· patent location history
2012–2014Patents assigned to YONEMOTO TAICHI (11)· patent assignee history
2012Patents assigned to TAGAWA YOSHINORI (6)· patent assignee history
2012–2014Patents assigned to ABO HIROYUKI (5)· patent assignee history
2012Patents assigned to FUJII KENJI (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 20 | 2011–2021 |
| YONEMOTO TAICHIself | 11 | 2012–2014 |
| TAGAWA YOSHINORI | 6 | 2012 |
| ABO HIROYUKI | 5 | 2012–2014 |
| FUJII KENJI | 5 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Isehara, JP | 20 | 2011–2021 |