Inventor

Masahiro Tsunooka

Inventor

Osaka, JP

Overview

1989–2004

Patent span

Physics

Primary field (CPC G)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices69%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests27%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%

PatentTitleYear

6,753,132'Pattern formation material and pattern formation method'2004 6,689,536'Pattern formation material and pattern formation method'2004 6,645,694'Pattern formation material and pattern formation method'2003 6,576,398'Pattern formation material and method'2003 6,511,786'Pattern formation material and pattern formation method'2003 6,387,598'Pattern forming material and pattern forming method'2002 6,387,592'Pattern forming material and pattern forming method'2002 6,376,154'Pattern forming material and pattern forming method'2002 6,306,556'Pattern forming material and pattern forming method'2001 6,261,736'Pattern forming material and pattern forming method'2001 6,120,974'Pattern forming material and pattern forming method'2000 6,017,683'Pattern forming material and pattern forming method'2000 5,965,325'Pattern forming material and pattern forming method'1999 5,928,840'Patterning material and patterning method'1999 5,683,857'Method for forming resist pattern by irradiating a resist coating on a substrate, contacting the resist with organic solvent vapor and removing the irradiated portion'1997 5,278,029'Method for forming a resist pattern'1994 5,213,946'Positive type, photosensitive resinous composition'1993 4,869,995'Positive type photosensitive resinous composition'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–1997Patents assigned to NIPPON PAINT CO LTD (4)· patent assignee history

1989–2003Based in Osaka, JP· patent location history

1997–2004Based in Sennan, JP· patent location history

1999–2004Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (14)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD	14	1999–2004
NIPPON PAINT CO LTD	4	1989–1997

Locations

Location	Patents	Span
Osaka, JP	12	1989–2003
Sennan, JP	6	1997–2004