Inventor
Yoshinori Nishiwaki
Inventor
Shizuoka, JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C09KMaterials for miscellaneous applications, not provided for elsewhere8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
C11DDetergent compositions6%
G02BOptical elements, systems or apparatus6%
H01LSemiconductor devices6%
PatentTitleYear
10,844,332Aqueous cleaning solution and method of protecting features on a substrate during etch residue removal20209,514,958'Etching method of semiconductor substrate, and method of producing semiconductor device'20167,857,985'Metal-polishing liquid and chemical mechanical polishing method using the same'20107,851,426'Cleaning liquid and cleaning method using the same'20107,836,721'Cooling system'20107,255,972'Chemically amplified positive photosensitive resin composition'20076,939,661'Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom'20056,465,148'Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom'20026,465,161'Method for forming resist pattern'20026,277,750'Composition for bottom reflection preventive film and novel polymeric dye for use in the same'20016,255,405'Light-absorbing polymers and application thereof to anti-reflection film'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2005Patents assigned to CLARIANT FINANCE BVI LTD (4)· patent assignee history
2001Patents assigned to CLARIANT INT LTD (1)· patent assignee history
2001–2016Based in Shizuoka, JP· patent location history
2002Based in Nishikamo-gun, JP· patent location history
2007Patents assigned to AZ ELECTRONIC MATERIALS USA (1)· patent assignee history
2010–2016Patents assigned to FUJIFILM CORP (3)· patent assignee history
2010Patents assigned to MAEKAWA SEISAKUSHO KK (1)· patent assignee history
2010Based in Kumamoto, JP· patent location history
2020Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CLARIANT FINANCE BVI LTD | 4 | 2001–2005 |
| FUJIFILM CORP | 3 | 2010–2016 |
| AZ ELECTRONIC MATERIALS USA | 1 | 2007 |
| CLARIANT INT LTD | 1 | 2001 |
| MAEKAWA SEISAKUSHO KK | 1 | 2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 8 | 2001–2016 |
| Tokyo, JP | 1 | 2020 |
| Kumamoto, JP | 1 | 2010 |
| Nishikamo-gun, JP | 1 | 2002 |