Inventor
Richard J. Kempf
Inventor
Towanda, PA, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
G03GElectrography43%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
PatentTitleYear
5,741,621'Process for using photoimageable films prepared for aqueous photoimageable liquid emulsions'19985,145,760'Positive-working photosensitive electrostatic master with improved invironmental latitude'19924,945,020'Photosensitive leuco dye containing electrostatic master with printout image'19904,859,551'Process for preparing positive and negative images using photohardenable electrostatic master'19894,716,093'Solvent developable photoresist composition and process of use'1987Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1987–1998Patents assigned to DU PONT (5)· patent assignee history
1987–1998Based in Towanda, PA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DU PONT | 5 | 1987–1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Towanda, Pennsylvania, US | 5 | 1987–1998 |