Inventor
KEEYOUNG PARK
Inventor
US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
B08BCleaning in general10%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients7%
C08LCompositions of macromolecular compounds7%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
C23FNon-mechanical removal of metallic material from surface7%
H10BElectronic memory devices7%
H10DInorganic electric semiconductor devices7%
H10NElectric solid-state devices not otherwise provided for7%
PatentTitleYear
12,150,386Ruthenium removal composition and method of producing magnetoresistive random access memory202411,508,569Surface treatment compositions and methods202211,456,412Ruthenium removal composition and method of producing magnetoresistive random access memory202211,447,642Methods of using surface treatment compositions202211,174,394Surface treatment compositions and articles containing same2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2022Patents assigned to FUJIFILM ELECTRONIC MAT USA INC (3)· patent assignee history
2021–2022Based in US· patent location history
2022–2024Patents assigned to FUJIFILM CORP (2)· patent assignee history
2022–2024Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM ELECTRONIC MAT USA INC | 3 | 2021–2022 |
| FUJIFILM CORP | 2 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 3 | 2021–2022 |
| JP | 2 | 2022–2024 |