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Inventor

Kirsten LOUTHAN

Inventor
US

Overview

2→
Patents
2024–2025
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
12,498,641Process environment for inorganic resist patterning202511,947,262Process environment for inorganic resist patterning2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2025Patents assigned to INPRIA CORP (2)· patent assignee history
2024–2025Based in US· patent location history
2025Patents assigned to TOKYO ELECTRON LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INPRIA CORP22024–2025
TOKYO ELECTRON LTD12025
Locations
LocationPatentsSpan
US22024–2025