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Inventor

Robbert Jan Voogd

Inventor
BE

Overview

3→
Patents
2022–2025
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
12,204,255Lithographic apparatus and method202511,630,399Lithographic apparatus and method202311,281,115Lithographic apparatus and method2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2022–2025Based in BE· patent location history
2023Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32022–2025
Locations
LocationPatentsSpan
BE22022–2025
NL12023