Inventor

Douglas C. Watson

Inventor

Campbell, CA, US

Overview

1996–2019

Patent span

Physics

Primary field (CPC G)

Patents· 76 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them11%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%

G02BOptical elements, systems or apparatus8%

F16FSprings4%

H01JElectric discharge tubes or discharge lamps4%

Y10TTechnical subjects covered by former us classification4%

F16CShafts3%

B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling3%

B08BCleaning in general2%

PatentTitleYear

10,185,222Liquid jet and recovery system for immersion lithography2019 9,958,786Cleanup method for optics in immersion lithography using object on wafer holder in place of wafer2018 9,910,370'Environmental system including a transport region for an immersion lithography apparatus'2018 9,785,057'Liquid jet and recovery system for immersion lithography'2017 9,644,720'Orientation independent focus mechanisms for laser radar'2017 9,632,427'Environmental system including a transport region for an immersion lithography apparatus'2017 9,341,942'Vacuum chamber assembly for supporting a workpiece'2016 9,323,157'Mirror assembly for an exposure apparatus'2016 9,304,385'Exposure method and device manufacturing method including selective deformation of a mask'2016 9,304,409'Liquid jet and recovery system for immersion lithography'2016 9,298,077'Reaction assembly for a stage assembly'2016 8,941,814'Multiple-blade holding devices'2015 8,937,289'High heat load optics with vibration isolated hoses in an extreme ultraviolet lithography system'2015 8,853,988'Control systems and methods for compensating for effects of a stage motor'2014 8,830,443'Environmental system including a transport region for an immersion lithography apparatus'2014 8,794,011'Method and apparatus for utilizing in-situ measurements techniques in conjunction with thermoelectric chips (TECs)'2014 8,767,174'Temperature-controlled holding devices for planar articles'2014 8,705,170'High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations'2014 8,441,615'System for isolating an exposure apparatus'2013 8,425,060'Self-correcting optical elements for high-thermal-load optical systems'2013 8,416,386'Conforming seats for clamps used in mounting an optical element, and optical systems comprising same'2013 8,085,381'Cleanup method for optics in immersion lithography using sonic device'2011 8,059,258'Liquid jet and recovery system for immersion lithography'2011 7,969,552'Environmental system including a transport region for an immersion lithography apparatus'2011 7,965,376'Environmental system including a transport region for an immersion lithography apparatus'2011 7,932,989'Liquid jet and recovery system for immersion lithography'2011 7,929,110'Environmental system including a transport region for an immersion lithography apparatus'2011 7,929,111'Environmental system including a transport region for an immersion lithography apparatus'2011 7,869,000'Stage assembly with lightweight fine stage and low transmissibility'2011 7,830,046'Damper for a stage assembly'2010 7,821,615'Liquid jet and recovery system for immersion lithography'2010 7,804,583'EUV reticle handling system and method'2010 7,717,966'Barrier assembly for an exposure apparatus'2010 7,692,768'Iron core motor driven automatic reticle blind'2010 7,688,421'Fluid pressure compensation for immersion lithography lens'2010 7,683,506'CI-core actuator for long travel in a transverse direction'2010 7,591,561'Liquid cooled mirror for use in extreme ultraviolet lithography'2009 7,583,361'System for controlling a dual mover assembly for an exposure apparatus'2009 7,522,259'Cleanup method for optics in immersion lithography'2009 7,477,358'EUV reticle handling system and method'2009 7,466,396'Lithography apparatus and method utilizing pendulum interferometer system'2008 7,443,482'Liquid jet and recovery system for immersion lithography'2008 7,345,742'Environmental system including a transport region for an immersion lithography apparatus'2008 7,251,017'Environmental system including a transport region for an immersion lithography apparatus'2007 7,172,493'Fine force actuator assembly for chemical mechanical polishing apparatuses'2007 7,095,482'Multiple system vibration isolator'2006 6,953,109'Vibration isolator with low lateral stiffness'2005 6,937,911'Compensating for cable drag forces in high precision stages'2005 6,927,838'Multiple stage, stage assembly having independent stage bases'2005 6,922,293'Kinematic optical mounting assembly with flexures'2005 6,903,346'Stage assembly having a follower assembly'2005 6,888,620'System and method for holding a device with minimal deformation'2005 6,882,126'Holder mover for a stage assembly'2005 6,880,942'Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system'2005 6,873,478'Kinematic lens mount with reduced clamping force'2005 6,842,226'Flexure supported wafer table'2005 6,842,277'Deformable mirror with high-bandwidth servo for rigid body control'2005 6,840,638'Deformable mirror with passive and active actuators'2005 6,815,695'Simplified reticle stage removal system for an electron beam system'2004 6,794,660'Long stroke mover for a stage assembly'2004 6,774,981'Modular exposure apparatus with removable optical device and improved isolation of the optical device'2004 6,756,706'Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines'2004 6,735,867'Method of making a static pressure air bearing'2004 6,734,947'Quick chamber seals'2004 6,731,372'Multiple chamber fluid mount'2004 6,666,611'Three degree of freedom joint'2003 6,648,509'Friction-drive stage'2003 6,639,654'Wafer stage carrier and removal assembly'2003 6,600,547'Sliding seal'2003 6,499,880'Static pressure air bearing'2002 6,467,960'Air bearing linear guide for use in a vacuum'2002 6,408,767'Low stiffness suspension for a stage'2002 6,281,655'High performance stage assembly'2001 6,239,924'Kinematic lens mounting with distributed support and radial flexure'2001 5,959,427'Method and apparatus for compensating for reaction forces in a stage assembly'1999 5,519,223'Apparatus and method for automated collimator exchange'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996Based in Santa Clara, CA, US· patent location history

1999–2019Patents assigned to NIKON CORP (73)· patent assignee history

1999–2019Based in Campbell, CA, US· patent location history

2003Based in Campell, CA, US· patent location history

2011–2016Patents assigned to WATSON DOUGLAS C (13)· patent assignee history

2011–2014Patents assigned to NOVAK W THOMAS (3)· patent assignee history

2013–2016Patents assigned to PHILLIPS ALTON H (5)· patent assignee history

2015–2017Patents assigned to WATSON LORRI L (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NIKON CORP	73	1999–2019
WATSON DOUGLAS Cself	13	2011–2016
PHILLIPS ALTON H	5	2013–2016
WATSON LORRI L	5	2015–2017
NOVAK W THOMAS	3	2011–2014

Locations

Location	Patents	Span
Campbell, California, US	74	1999–2019
Campell, California, US	1	2003
Santa Clara, California, US	1	1996