Inventor
Norman Baer
Inventor
Aalen, DE
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus23%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
B82YSpecific uses or applications of nanostructures15%
G21KHandling of particles or ionising radiation not otherwise provided for15%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them13%
H01JElectric discharge tubes or discharge lamps5%
A63CSkates3%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
10,684,551EUV exposure apparatus with reflective elements having reduced influence of temperature variation202010,317,802EUV exposure apparatus with reflective elements having reduced influence of temperature variation201910,031,423EUV exposure apparatus with reflective elements having reduced influence of temperature variation20189,746,778'EUV exposure apparatus with reflective elements having reduced influence of temperature variation'20179,671,703'Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement'20179,575,224'Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective'20179,316,929'EUV exposure apparatus with reflective elements having reduced influence of temperature variation'20169,207,541'Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus'20159,201,226'Imaging optics'20155,412,207'Method and apparatus for analyzing a gas sample'19954,993,725'Unitary skate assembly having vertical spring means'19914,018,241'Method and inlet control system for controlling a gas flow sample to an evacuated chamber'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–1995Based in Boulder, CO, US· patent location history
2015–2020Patents assigned to ZEISS CARL SMT GMBH (9)· patent assignee history
2015Patents assigned to BAER NORMAN (1)· patent assignee history
2015Patents assigned to LOERING ULRICH (1)· patent assignee history
2015Patents assigned to MANN HANS-JUERGEN (1)· patent assignee history
2015–2020Based in Aalen, DE· patent location history
2016–2020Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 9 | 2015–2020 |
| ASML NETHERLANDS BV | 5 | 2016–2020 |
| BAER NORMANself | 1 | 2015 |
| LOERING ULRICH | 1 | 2015 |
| MANN HANS-JUERGEN | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 9 | 2015–2020 |
| Boulder, CO, US | 3 | 1977–1995 |